OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Atomic layer deposition of thin films: from a chemistry perspective
Jinxiong Li, Gaoda Chai, Xinwei Wang
International Journal of Extreme Manufacturing (2023) Vol. 5, Iss. 3, pp. 032003-032003
Open Access | Times Cited: 42
Jinxiong Li, Gaoda Chai, Xinwei Wang
International Journal of Extreme Manufacturing (2023) Vol. 5, Iss. 3, pp. 032003-032003
Open Access | Times Cited: 42
Showing 26-50 of 42 citing articles:
Molecular approach to semiconductors: a shift towards ecofriendly manufacturing and neuroinspired interfaces
Kirill Yu. Monakhov, Christoph Meinecke, Marco Moors, et al.
Pure and Applied Chemistry (2024)
Closed Access | Times Cited: 2
Kirill Yu. Monakhov, Christoph Meinecke, Marco Moors, et al.
Pure and Applied Chemistry (2024)
Closed Access | Times Cited: 2
Unveiling growth mechanisms of PEALD In2O3 thin films with amide-based versus alkyl-based novel indium precursors
Gyeong Min Jeong, Hae Lin Yang, Ara Yoon, et al.
Journal of Materials Chemistry C (2024) Vol. 12, Iss. 28, pp. 10575-10584
Closed Access | Times Cited: 1
Gyeong Min Jeong, Hae Lin Yang, Ara Yoon, et al.
Journal of Materials Chemistry C (2024) Vol. 12, Iss. 28, pp. 10575-10584
Closed Access | Times Cited: 1
Chemical Bonding and Crystal Structure Schemes in Atomic/Molecular Layer Deposited Fe-Terephthalate Thin Films
Topias Jussila, Anish Philip, Víctor Rubio‐Giménez, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 13, pp. 6489-6503
Open Access | Times Cited: 1
Topias Jussila, Anish Philip, Víctor Rubio‐Giménez, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 13, pp. 6489-6503
Open Access | Times Cited: 1
Atomic layer deposition of Al-doped ZnO nanomembrane with in situ monitoring
Jinlong Wang, Zilong Gu, Zhe Zhao, et al.
Nanotechnology (2024) Vol. 35, Iss. 40, pp. 405704-405704
Closed Access | Times Cited: 1
Jinlong Wang, Zilong Gu, Zhe Zhao, et al.
Nanotechnology (2024) Vol. 35, Iss. 40, pp. 405704-405704
Closed Access | Times Cited: 1
Improvement of the Ferroelectric Response of La-Doped Hafnium Zirconium Oxide Employing Tungsten Oxide Interfacial Layer with Back-End-of-Line Compatibility
Dae Seon Kwon, Jasper Bizindavyi, Gourab De, et al.
ACS Applied Materials & Interfaces (2024) Vol. 16, Iss. 31, pp. 41704-41715
Closed Access | Times Cited: 1
Dae Seon Kwon, Jasper Bizindavyi, Gourab De, et al.
ACS Applied Materials & Interfaces (2024) Vol. 16, Iss. 31, pp. 41704-41715
Closed Access | Times Cited: 1
Ultrathin In2O3 thin-film transistors deposited from trimethylindium and ozone
Jianzhang Zhu, Jinxiong Li, Shanshan Ju, et al.
Nanotechnology (2024) Vol. 35, Iss. 43, pp. 435205-435205
Closed Access | Times Cited: 1
Jianzhang Zhu, Jinxiong Li, Shanshan Ju, et al.
Nanotechnology (2024) Vol. 35, Iss. 43, pp. 435205-435205
Closed Access | Times Cited: 1
Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma
Nicholas J. Chittock, Joris Maas, Ilker Tezsevin, et al.
Journal of Materials Chemistry C (2024)
Open Access | Times Cited: 1
Nicholas J. Chittock, Joris Maas, Ilker Tezsevin, et al.
Journal of Materials Chemistry C (2024)
Open Access | Times Cited: 1
Plasma‐Enhanced Atomic Layer Deposition of Amorphous Tantalum Thin Films for Copper Interconnects Using an Organometallic Precursor
Xu Tian, Yuancan Ding, Gaoda Chai, et al.
Advanced Materials Technologies (2023) Vol. 9, Iss. 4
Closed Access | Times Cited: 1
Xu Tian, Yuancan Ding, Gaoda Chai, et al.
Advanced Materials Technologies (2023) Vol. 9, Iss. 4
Closed Access | Times Cited: 1
微波法快速、原位合成NiFe LDH纳米片阵列用于高效电催化水氧化
S. C. Wang, Xuyun Lu, Yanan Chang, et al.
Chinese Science Bulletin (Chinese Version) (2024)
Closed Access
S. C. Wang, Xuyun Lu, Yanan Chang, et al.
Chinese Science Bulletin (Chinese Version) (2024)
Closed Access
The surface chemistry of the atomic layer deposition of ruthenium on aluminum and tantalum oxide surfaces
Xiangdong Qin, Francisco Zaera
Surface Science (2024) Vol. 749, pp. 122572-122572
Closed Access
Xiangdong Qin, Francisco Zaera
Surface Science (2024) Vol. 749, pp. 122572-122572
Closed Access
Integrating Data Mining and Natural Language Processing to Construct a Melting Point Database for Organometallic Compounds
Jinyoung Jeong, Taehyun Park, Junho Song, et al.
Journal of Chemical Information and Modeling (2024)
Closed Access
Jinyoung Jeong, Taehyun Park, Junho Song, et al.
Journal of Chemical Information and Modeling (2024)
Closed Access
Mott Memristors for Neuromorphics
Zherui Zhao, Wanhong Luan, Yongbiao Zhai, et al.
Advanced Physics Research (2024)
Open Access
Zherui Zhao, Wanhong Luan, Yongbiao Zhai, et al.
Advanced Physics Research (2024)
Open Access
Synthesis and Structure of Ag(I) Complexes with Tris(3,5-Dimethylpyrazol-1-yl)Methane and β-Diketones
E. S. Vikulova, Taisiya S. Sukhikh, Alexandra Barysheva, et al.
Journal of Structural Chemistry (2024) Vol. 65, Iss. 11, pp. 2327-2344
Closed Access
E. S. Vikulova, Taisiya S. Sukhikh, Alexandra Barysheva, et al.
Journal of Structural Chemistry (2024) Vol. 65, Iss. 11, pp. 2327-2344
Closed Access
Silver CVD and ALD Precursors: Synthesis, Properties, and Application in Deposition Processes
E. S. Vikulova, S. I. Dorovskikh, Tamara V. Basova, et al.
Molecules (2024) Vol. 29, Iss. 23, pp. 5705-5705
Open Access
E. S. Vikulova, S. I. Dorovskikh, Tamara V. Basova, et al.
Molecules (2024) Vol. 29, Iss. 23, pp. 5705-5705
Open Access
Structure and Properties of Ni(II) Complexes with Heptanedione-3.5
M. Zhezhera, Д. В. Кочелаков, P. А. Stabnikov, et al.
Journal of Structural Chemistry (2024) Vol. 65, Iss. 12, pp. 2406-2419
Closed Access
M. Zhezhera, Д. В. Кочелаков, P. А. Stabnikov, et al.
Journal of Structural Chemistry (2024) Vol. 65, Iss. 12, pp. 2406-2419
Closed Access
Introduction to ALD Technologies
Peter Ozaveshe Oviroh, Sunday Temitope Oyinbo, Sina Karimzadeh, et al.
Springer series in materials science (2024), pp. 1-25
Closed Access
Peter Ozaveshe Oviroh, Sunday Temitope Oyinbo, Sina Karimzadeh, et al.
Springer series in materials science (2024), pp. 1-25
Closed Access
Surface Chemical Reactions During Atomic Layer Deposition of Zinc Oxynitride (ZnON)
Tran Thi Ngoc Van, Bonggeun Shong
Electronic Materials Letters (2023) Vol. 20, Iss. 4, pp. 500-507
Closed Access
Tran Thi Ngoc Van, Bonggeun Shong
Electronic Materials Letters (2023) Vol. 20, Iss. 4, pp. 500-507
Closed Access
Structure and Thermal Properties of Tris-(methylcyclopentadienyl)Scandium
D. E. Petukhova, A. V. Sartakova, Taisiya S. Sukhikh, et al.
Journal of Structural Chemistry (2023) Vol. 64, Iss. 12, pp. 2461-2471
Closed Access
D. E. Petukhova, A. V. Sartakova, Taisiya S. Sukhikh, et al.
Journal of Structural Chemistry (2023) Vol. 64, Iss. 12, pp. 2461-2471
Closed Access
