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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules
Jeong‐Min Lee, Jinseon Lee, Ji Won Han, et al.
Applied Surface Science (2020) Vol. 539, pp. 148247-148247
Closed Access | Times Cited: 28

Showing 1-25 of 28 citing articles:

Unveiling the synergistic doping and heterojunction of P-doped C3N5/CdS towards solar-driven hydrogen generation
Valerine Khoo, Joel Jie Foo, Brenden Jing Su, et al.
International Journal of Hydrogen Energy (2025) Vol. 101, pp. 636-649
Closed Access | Times Cited: 2
Additive Manufacturing: A Paradigm Shift in Revolutionizing Catalysis with 3D Printed Photocatalysts and Electrocatalysts Toward Environmental Sustainability
Valerine Khoo, Sue‐Faye Ng, Choon Yian Haw, et al.
Small (2024) Vol. 20, Iss. 31
Closed Access | Times Cited: 15
Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity
Jinseon Lee, Jeong‐Min Lee, Hongjun Oh, et al.
Advanced Functional Materials (2021) Vol. 31, Iss. 33
Closed Access | Times Cited: 50
Highly area-selective atomic layer deposition of device-quality Hf1-xZrxO2 thin films through catalytic local activation
Hyo‐Bae Kim, Jeong‐Min Lee, Dougyong Sung, et al.
Chemical Engineering Journal (2024) Vol. 488, pp. 150760-150760
Closed Access | Times Cited: 8
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Ilker Tezsevin, Joris Maas, Marc J. M. Merkx, et al.
Langmuir (2023) Vol. 39, Iss. 12, pp. 4265-4273
Open Access | Times Cited: 16
Enhancing chemisorption efficiency and thin-film characteristics via a discrete feeding method in high-k dielectric atomic layer deposition for preventing interfacial layer formation
Aejin Lee, Seung‐Woo Lee, Dong Hee Han, et al.
Journal of Materials Chemistry C (2023) Vol. 11, Iss. 21, pp. 6894-6901
Closed Access | Times Cited: 15
Nanoscale interface engineering for solid oxide fuel cells using atomic layer deposition
Jongsu Seo, Seung‐Hyun Kim, SungHyun Jeon, et al.
Nanoscale Advances (2022) Vol. 4, Iss. 4, pp. 1060-1073
Open Access | Times Cited: 22
Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates
Jeong‐Min Lee, Jinseon Lee, Hongjun Oh, et al.
Applied Surface Science (2022) Vol. 589, pp. 152939-152939
Closed Access | Times Cited: 22
Advanced Atomic Layer Deposition: Ultrathin and Continuous Metal Thin Film Growth and Work Function Control Using the Discrete Feeding Method
Ji Won Han, Hyun Soo Jin, Yoon Jeong Kim, et al.
Nano Letters (2022) Vol. 22, Iss. 11, pp. 4589-4595
Closed Access | Times Cited: 21
Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces
Jinseon Lee, Jieun Oh, Jiwon Kim, et al.
Applied Surface Science (2024) Vol. 662, pp. 160099-160099
Closed Access | Times Cited: 4
Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten
Hwan Oh, Jung‐Sik Kim, Hannah R. M. Margavio, et al.
Chemistry of Materials (2023) Vol. 35, Iss. 11, pp. 4375-4384
Closed Access | Times Cited: 10
Deposition selectivity on oxide versus metal surfaces via catalyzed atomic layer deposition of SiO2 and vapor-dosed phosphonic acid inhibitors
Jeong‐Min Lee, Ji Hun Lee, Seo-Hyun Lee, et al.
Applied Surface Science (2025), pp. 162337-162337
Closed Access
SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation
Hwan Oh, Hyuenwoo Yang, N Carroll, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 3
Closed Access
Crystalline 1D Coordination Polymer Inhibitor Layer Leads to Vertical Sidewalls in Selectively Deposited ZnO on Nanoscale Patterns
Alexander Shearer, Yukio Cho, Miso Kim, et al.
ACS Nano (2025)
Closed Access
Advanced Fabrication of Ultrathin Ruthenium Films Using Synergistic Atomic Layer Deposition and Etching
Jeongbin Lee, Jung‐Tae Kim, Jieun Oh, et al.
Small Methods (2025)
Closed Access
Low-temperature thermal atomic layer deposition of beryllium oxide films using discrete feeding methods
Juyoung Chae, Jonghyun Bae, Yoonseo Jang, et al.
Applied Surface Science Advances (2025) Vol. 27, pp. 100740-100740
Closed Access
Coupled multiple heterogeneous interfaces lychee-like FeSiAl@C@SiO2@BTA for self-healing corrosion protection and enhanced microwave absorption
Yang Guo, Rui Zhou
Materials Science in Semiconductor Processing (2024) Vol. 182, pp. 108708-108708
Closed Access | Times Cited: 3
Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method
Jae Chan Park, Chang Ik Choi, Sang‐Gil Lee, et al.
Journal of Materials Chemistry C (2022) Vol. 11, Iss. 4, pp. 1298-1303
Closed Access | Times Cited: 14
Area Selective Deposition of Ru on W/SiO2 Nanopatterns via Sequential Reactant Dosing and Thermal Defect Correction
Zilian Qi, Haojie Li, Kun Cao, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 17, pp. 8133-8140
Closed Access | Times Cited: 2
Area‐Selective Atomic Layer Deposition Using Vapor Dosing of Short‐Chain Alkanethiol Inhibitors on Metal/Dielectric Surfaces
Jeongbin Lee, Jeong‐Min Lee, Ji‐Hoon Ahn, et al.
Advanced Materials Interfaces (2022) Vol. 9, Iss. 13
Closed Access | Times Cited: 11
Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions
Neung-Kyung Yu, Jeong‐Min Lee, Woo‐Hee Kim, et al.
Applied Surface Science (2023) Vol. 636, pp. 157864-157864
Closed Access | Times Cited: 6
The Effect of Surface Terminations on the Initial Stages of TiO2 Deposition on Functionalized Silicon
Tyler Parke, Dhamelyz Silva-Quiñones, George T. Wang, et al.
ChemPhysChem (2022) Vol. 24, Iss. 7
Open Access | Times Cited: 8
Area-Selective Atomic Layer Deposition of SnS2 Nanosheets for Applications of Back-End-of-Line-Compatible Transistors
Jaegyun Yim, Hong Keun Chung, Seung Ho Ryu, et al.
ACS Applied Nano Materials (2023) Vol. 6, Iss. 3, pp. 1678-1685
Closed Access | Times Cited: 4
Low‐Temperature Dual‐Material Area‐Selective Deposition: Molybdenum Hexafluoride‐Mediated SiO2 Fluorination/Passivation for Self‐Aligned Molybdenum/Metal Oxide Nanoribbons
Hwan Oh, Jeremy M. Thelven, Hannah R. M. Margavio, et al.
Advanced Functional Materials (2024) Vol. 34, Iss. 33
Open Access | Times Cited: 1
Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition
Alexander Shearer, Fabian Pieck, Josiah Yarbrough, et al.
Chemistry of Materials (2024)
Closed Access | Times Cited: 1
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