OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Pengmei Yu, Marc J. M. Merkx, Ilker Tezsevin, et al.
Applied Surface Science (2024) Vol. 665, pp. 160141-160141
Open Access | Times Cited: 13
Pengmei Yu, Marc J. M. Merkx, Ilker Tezsevin, et al.
Applied Surface Science (2024) Vol. 665, pp. 160141-160141
Open Access | Times Cited: 13
Showing 13 citing articles:
Accurately Computed Dimerization Trends of ALD Precursors and Their Impact on Surface Reactivity in Area-Selective Atomic Layer Deposition
Patrick Maué, Émilie Chantraine, Fabian Pieck, et al.
Chemistry of Materials (2025)
Closed Access | Times Cited: 2
Patrick Maué, Émilie Chantraine, Fabian Pieck, et al.
Chemistry of Materials (2025)
Closed Access | Times Cited: 2
Competitive Adsorption of Small Molecule Inhibitors and Trimethylaluminum Precursors on the Cu(111) Surface during Area-Selective Atomic Layer Deposition: A GCMC Study
Chen Li, Yichun Li, Jian Weng, et al.
Langmuir (2025)
Closed Access | Times Cited: 1
Chen Li, Yichun Li, Jian Weng, et al.
Langmuir (2025)
Closed Access | Times Cited: 1
Molecular Design in Area-Selective Atomic Layer Deposition: Understanding Inhibitors and Precursors
Yujin Lee, Amnon Rothman, Alexander Shearer, et al.
Chemistry of Materials (2025)
Closed Access | Times Cited: 1
Yujin Lee, Amnon Rothman, Alexander Shearer, et al.
Chemistry of Materials (2025)
Closed Access | Times Cited: 1
An Atomistic Picture of Buildup and Degradation Reactions in Area-Selective Atomic Layer Deposition with a Small Molecule Inhibitor
Paul Philipp Wellmann, Fabian Pieck, Ralf Tonner
Chemistry of Materials (2024) Vol. 36, Iss. 15, pp. 7343-7361
Open Access | Times Cited: 4
Paul Philipp Wellmann, Fabian Pieck, Ralf Tonner
Chemistry of Materials (2024) Vol. 36, Iss. 15, pp. 7343-7361
Open Access | Times Cited: 4
Deposition selectivity on oxide versus metal surfaces via catalyzed atomic layer deposition of SiO2 and vapor-dosed phosphonic acid inhibitors
Jeong‐Min Lee, Ji Hun Lee, Seo-Hyun Lee, et al.
Applied Surface Science (2025), pp. 162337-162337
Closed Access
Jeong‐Min Lee, Ji Hun Lee, Seo-Hyun Lee, et al.
Applied Surface Science (2025), pp. 162337-162337
Closed Access
Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness Limitations
T. G. Kim, Han Kim, Seung Ho Ryu, et al.
Chemistry of Materials (2025)
Closed Access
T. G. Kim, Han Kim, Seung Ho Ryu, et al.
Chemistry of Materials (2025)
Closed Access
Computational Ab Initio Approaches for Area-Selective Atomic Layer Deposition: Methods, Status, and Perspectives
Fabian Pieck, Ralf Tonner
Chemistry of Materials (2025)
Closed Access
Fabian Pieck, Ralf Tonner
Chemistry of Materials (2025)
Closed Access
Accurately computed dimerization fraction of ALD precursors and their impact on surface reactivity in area-selective atomic layer deposition
Patrick Maué, Émilie Chantraine, Fabian Pieck, et al.
(2024)
Open Access | Times Cited: 2
Patrick Maué, Émilie Chantraine, Fabian Pieck, et al.
(2024)
Open Access | Times Cited: 2
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes
Ilker Tezsevin, J. H. Deijkers, Marc J. M. Merkx, et al.
The Journal of Physical Chemistry Letters (2024) Vol. 15, Iss. 29, pp. 7496-7501
Open Access | Times Cited: 1
Ilker Tezsevin, J. H. Deijkers, Marc J. M. Merkx, et al.
The Journal of Physical Chemistry Letters (2024) Vol. 15, Iss. 29, pp. 7496-7501
Open Access | Times Cited: 1
Effect of Al precursor’s properties on interactions with self-assembled monolayers for area selective deposition
Eryan Gu, Yan Jin, Boxuan Li, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Closed Access | Times Cited: 1
Eryan Gu, Yan Jin, Boxuan Li, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Closed Access | Times Cited: 1
Preparation of Br-terminated Si(100) and Si(111) surfaces and their use as atomic layer deposition resists
John R. Mason, Andrew V. Teplyakov
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Closed Access | Times Cited: 1
John R. Mason, Andrew V. Teplyakov
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Closed Access | Times Cited: 1
Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition
Alexander Shearer, Fabian Pieck, Josiah Yarbrough, et al.
Chemistry of Materials (2024)
Closed Access | Times Cited: 1
Alexander Shearer, Fabian Pieck, Josiah Yarbrough, et al.
Chemistry of Materials (2024)
Closed Access | Times Cited: 1
Area-Selective Molecular Layer Deposition of Alucone on Photoresist for Enhanced Pattern Transfer
Long Liu, Yue Zhang, Wenda Bao, et al.
Chemistry of Materials (2024)
Closed Access
Long Liu, Yue Zhang, Wenda Bao, et al.
Chemistry of Materials (2024)
Closed Access
