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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Selective electrochemical mechanical polishing of 4H–SiC surface employing porous material impregnated with electrolyte
Xiaozhe Yang, Xu Yang, Zhuangde Jiang, et al.
Ceramics International (2023) Vol. 49, Iss. 22, pp. 34569-34581
Closed Access | Times Cited: 10

Showing 10 citing articles:

Sustainable Electrochemical Mechanical Polishing (ECMP) for 4H-SiC wafer using chemical-free polishing slurry with hydrocarbon-based solid polymer electrolyte
Naoki Inada, Masaru Takizawa, M. Adachi, et al.
Applied Surface Science (2024) Vol. 664, pp. 160241-160241
Open Access | Times Cited: 13
Mechanism of friction-induced chemical reaction high-efficient polishing single crystal 4H-SiC wafer using pure iron
Min Wu, Hui Huang, Yueqin Wu, et al.
Tribology International (2024) Vol. 193, pp. 109450-109450
Closed Access | Times Cited: 7
Scratching properties of 4H–SiC single crystal after oxidation under different conditions
Xinxing Ban, Zhuangzhi Tian, Shaodong Zheng, et al.
Wear (2024) Vol. 556-557, pp. 205503-205503
Closed Access | Times Cited: 4
Oxidation behavior and mechanism of 4H-SiC surface by holes in electrochemical and photoelectrochemical systems
Yang Zhao, Shang Gao, Yuewen Sun, et al.
Applied Surface Science (2024), pp. 162010-162010
Closed Access | Times Cited: 4
Electric-field-modulated oxidation and its effect on photoelectrochemical mechanical polishing of 4H-SiC
Yang Zhao, Shang Gao, Yuewen Sun, et al.
International Journal of Mechanical Sciences (2025), pp. 110247-110247
Closed Access
Rotary laser thinning of silicon wafer via diffractive optical element: Effects of process parameters on surface integrity
Qingfeng Li, Yizheng Wang, Haohua Xiu, et al.
Journal of Manufacturing Processes (2025) Vol. 143, pp. 160-177
Open Access
Electrochemical Mechanical Polishing
Xu Yang, Xiaozhe Yang, Kazuya Yamamura
Springer tracts in mechanical engineering (2025), pp. 381-404
Closed Access
Effect of Voltage on Electrochemical Mechanical Polishing (ECMP) of 4H-SiC with Fixed Abrasives
Pengfei Wu, Dongdong Zhao, Ning Liu, et al.
Journal of Materials Research and Technology (2025) Vol. 36, pp. 7807-7817
Open Access
Insight into the atomic-scale material removal of 4H-SiC electrochemical mechanical polishing (ECMP) using graphene oxide
Zirui Wang, Yuguang Zhu, Ronghao Ren, et al.
Tribology International (2025), pp. 110803-110803
Closed Access
Effect of UV-Illumination on Electrochemical Anodic Oxidation of SiC
Zhenghao Wei, Zhiyu Wang, Huiqiang Liang, et al.
Journal of Materials Processing Technology (2024), pp. 118703-118703
Closed Access | Times Cited: 2
Microscopic removal mechanism of 4 H-SiC during abrasive scratching in aqueous H2O2 and H2O: Insights from ReaxFF molecular dynamics
Xinxing Ban, Shaodong Zheng, Zhuangzhi Tian, et al.
Tribology International (2024) Vol. 200, pp. 110109-110109
Closed Access | Times Cited: 1
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