OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Effects of plasma power on ferroelectric properties of HfO2-ZrO2 nanolaminates produced by plasma enhanced atomic layer deposition
Yeonghwan Ahn, Yerin Jeon, Seokwon Lim, et al.
Surfaces and Interfaces (2023) Vol. 37, pp. 102669-102669
Closed Access | Times Cited: 6
Yeonghwan Ahn, Yerin Jeon, Seokwon Lim, et al.
Surfaces and Interfaces (2023) Vol. 37, pp. 102669-102669
Closed Access | Times Cited: 6
Showing 6 citing articles:
Understanding the Effect of Top Electrode on Ferroelectricity in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films
Xuepei Wang, Yichen Wen, Maokun Wu, et al.
ACS Applied Materials & Interfaces (2023) Vol. 15, Iss. 12, pp. 15657-15667
Closed Access | Times Cited: 24
Xuepei Wang, Yichen Wen, Maokun Wu, et al.
ACS Applied Materials & Interfaces (2023) Vol. 15, Iss. 12, pp. 15657-15667
Closed Access | Times Cited: 24
Oxygen Vacancy Modulation With TiO₂ Stack Interface Engineering for Ferroelectric Hf0.5Zr0.5O₂ Thin Films
Xuepei Wang, Maokun Wu, Boyao Cui, et al.
IEEE Electron Device Letters (2023) Vol. 45, Iss. 1, pp. 100-103
Closed Access | Times Cited: 10
Xuepei Wang, Maokun Wu, Boyao Cui, et al.
IEEE Electron Device Letters (2023) Vol. 45, Iss. 1, pp. 100-103
Closed Access | Times Cited: 10
Effect of ALD temperature on the polarization switching dynamics of BEOL-compatible Hf0.5Zr0.5O2 ferroelectric film
Xiaopeng Li, Lu Tai, Xiaoyu Dou, et al.
Applied Physics Letters (2025) Vol. 126, Iss. 15
Closed Access
Xiaopeng Li, Lu Tai, Xiaoyu Dou, et al.
Applied Physics Letters (2025) Vol. 126, Iss. 15
Closed Access
Exploring tungsten-oxygen vacancy synergy: Impact on leakage characteristics in Hf0.5Zr0.5O2 ferroelectric thin films
Xuepei Wang, Maokun Wu, Ting Zhang, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 23
Closed Access | Times Cited: 3
Xuepei Wang, Maokun Wu, Ting Zhang, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 23
Closed Access | Times Cited: 3
Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory
Da Hee Hong, Jae Hoon Yoo, Won Ji Park, et al.
Nanomaterials (2023) Vol. 13, Iss. 5, pp. 900-900
Open Access | Times Cited: 3
Da Hee Hong, Jae Hoon Yoo, Won Ji Park, et al.
Nanomaterials (2023) Vol. 13, Iss. 5, pp. 900-900
Open Access | Times Cited: 3
Room-Temperature Quantum Diodes with Dynamic Memory for Neural Logic Operations
Mohit Kumar, Jiyeong Park, J.H. Kim, et al.
ACS Applied Materials & Interfaces (2023) Vol. 15, Iss. 48, pp. 56003-56013
Closed Access | Times Cited: 1
Mohit Kumar, Jiyeong Park, J.H. Kim, et al.
ACS Applied Materials & Interfaces (2023) Vol. 15, Iss. 48, pp. 56003-56013
Closed Access | Times Cited: 1
