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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Polishing performance and mechanism of a novel Fe-based slurry for chemical mechanical polishing
Shi-Dong Chen, Hong Lei
Tribology International (2024) Vol. 194, pp. 109549-109549
Closed Access | Times Cited: 15

Showing 15 citing articles:

Novel photocatalysis-assisted mechanical polishing of laser cladding cobalt-based alloy using TiO2 nanoparticles
Renquan Ji, Qintao Shen, Li Zhang, et al.
Powder Technology (2024) Vol. 444, pp. 119990-119990
Closed Access | Times Cited: 19
Close atomic surface on aluminum alloy using green chemical mechanical polishing with synergistic effect between yttria and silica abrasives
Zeyun Wang, Zhenyu Zhang, Hongxiu Zhou, et al.
Applied Surface Science (2024), pp. 161586-161586
Closed Access | Times Cited: 4
Effect of a novel alginate/5-aminovaleric acid slurry with CeO2/MoS2 abrasives on surface roughness and material removal rate of quartz glass
Gong Lv, Enqiang Hao, Zefang Zhang, et al.
Applied Surface Science (2025), pp. 163096-163096
Closed Access
Study on material removal mechanism of solid phase Fenton catalytic polishing of SiC wafer with gel-forming abrasive disc
Kaiping Feng, Lanxing Xu, Yanzhang Gu, et al.
Materials Science in Semiconductor Processing (2025) Vol. 194, pp. 109488-109488
Closed Access
Study on the inhibition mechanism and removal mechanism of non-uniform removal of composite materials by multiphysics coupling polishing method
Yan Gu, Huibo Zhao, Jieqiong Lin, et al.
Journal of Materials Processing Technology (2025), pp. 118841-118841
Closed Access
Rotary laser thinning of silicon wafer via diffractive optical element: Effects of process parameters on surface integrity
Qingfeng Li, Yizheng Wang, Haohua Xiu, et al.
Journal of Manufacturing Processes (2025) Vol. 143, pp. 160-177
Open Access
Label recognition on metal surfaces in semiconductor industry by YOLO object detection model
Wei‐Chang Yeh, Shu‐Yi Liao, Chia-Ling Huang
The International Journal of Advanced Manufacturing Technology (2025)
Open Access
Development of a Generalized Model for Reaxff Molecular Dynamics Simulation: Investigating the Synergistic Mechanism of Chemical Oxidation and Mechanical Removal in the Planarization Process of Sic
Shi-Dong Chen, Hong Lei
(2025)
Closed Access
Insight into the atomic-scale material removal of 4H-SiC electrochemical mechanical polishing (ECMP) using graphene oxide
Zirui Wang, Yuguang Zhu, Ronghao Ren, et al.
Tribology International (2025), pp. 110803-110803
Closed Access
Optimization of polishing fluid composition for single crystal silicon carbide by ultrasonic assisted chemical-mechanical polishing
Linzheng Ye, Jialong Wu, Xijing Zhu, et al.
Scientific Reports (2024) Vol. 14, Iss. 1
Closed Access | Times Cited: 2
Development of Ce/Cu co-doped dendritic mesoporous silica nanoparticles (DMSNs) as novel abrasive systems toward high-performance chemical mechanical polishing
Wenjin Zhou, Yang Chen, Chao Wang, et al.
Ceramics International (2024) Vol. 50, Iss. 18, pp. 33235-33250
Closed Access | Times Cited: 1
Simulation of chemical reactions with methanol and oxalic acid on 4H-SiC surfaces before and after nanoabrasion
Wei Jiang, Jiapeng Chen, Xiongjie Wu, et al.
Applied Surface Science (2024) Vol. 677, pp. 161035-161035
Closed Access | Times Cited: 1
Fabrication of a novel Mn-based slurry via chemical precipitation and ultrasonic impregnation for efficient planarization of 4H-SiC (0001) through chemical mechanical polishing
Shi-Dong Chen, Hong Lei, Ruling Chen, et al.
Ceramics International (2024)
Closed Access | Times Cited: 1
Dual Functionality of DTPMP and OHA: Enhancement in Removal Rates and Excellent Surface Quality of Cobalt CMP
Liunan She, Yingqi Di, Le Zhai, et al.
Electrochimica Acta (2024), pp. 145591-145591
Closed Access | Times Cited: 1
Design of a torus magnetorheological finishing (TMRF) device for optical manufacturing
Hailun Si, Bo Wang, Ci Song, et al.
The International Journal of Advanced Manufacturing Technology (2024)
Closed Access
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