OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications
Richard Drevet, Pavel Souček, Pavel Mareš, et al.
Vacuum (2023) Vol. 221, pp. 112881-112881
Closed Access | Times Cited: 6

Showing 6 citing articles:

Realization of high transparent mobility zinc‐doped indium oxide (IZO) thin films by RF‐magnetron sputtering
Bingxue Han, Zhijun Wang, Lijia Chen, et al.
International Journal of Applied Ceramic Technology (2024) Vol. 21, Iss. 6, pp. 4001-4013
Closed Access | Times Cited: 5

Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
Richard Drevet, Pavel Souček, Pavel Mareš, et al.
Surface and Coatings Technology (2025), pp. 131865-131865
Closed Access

Floating potential probes for process control during reactive magnetron sputtering
Josja Van Bever, Petr Vašina, Richard Drevet, et al.
Surface and Coatings Technology (2024), pp. 131405-131405
Closed Access | Times Cited: 1

Improved barrier performance of Al2O3/polymer multi-layers by insertion of Alucone as hydrolysis inhibition layer and interfacial infiltration
Yuyan Peng, JinWei Zhao, Chun-Liang Chen, et al.
Vacuum (2024) Vol. 225, pp. 113257-113257
Closed Access

Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
Aneta Písaříková, Hana Krýsová, Anna Kapran, et al.
Materials Science in Semiconductor Processing (2024) Vol. 186, pp. 109034-109034
Open Access

A systematic review of the production of high-purity aluminum: applications, preparation, and mechanisms
Biao Zeng, Changke Chen, Hongliang Zhao, et al.
Journal of Materials Research and Technology (2024)
Open Access

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