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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
Gregory N. Parsons, Robert D. Clark
Chemistry of Materials (2020) Vol. 32, Iss. 12, pp. 4920-4953
Closed Access | Times Cited: 266

Showing 1-25 of 266 citing articles:

The 2022 Plasma Roadmap: low temperature plasma science and technology
Igor Adamovich, Sumit Agarwal, Eduardo Ahedo, et al.
Journal of Physics D Applied Physics (2022) Vol. 55, Iss. 37, pp. 373001-373001
Open Access | Times Cited: 331
Single-Atom Catalysts Designed and Prepared by the Atomic Layer Deposition Technique
Javier Fonseca, Junling Lu
ACS Catalysis (2021) Vol. 11, Iss. 12, pp. 7018-7059
Closed Access | Times Cited: 201
Piezoelectricity, Pyroelectricity, and Ferroelectricity in Biomaterials and Biomedical Applications
Yuan Xue, Jiacheng Shi, Yong Kang, et al.
Advanced Materials (2023) Vol. 36, Iss. 3
Closed Access | Times Cited: 78
Nucleation and growth of thin films
Việt Hương Nguyễn, Abderrahime Sekkat, Hao Van Bui, et al.
Elsevier eBooks (2024), pp. 41-64
Closed Access | Times Cited: 20
Atomic/molecular layer deposition strategies for enhanced CO2 capture, utilisation and storage materials
Joshua O. Olowoyo, Vahid Shahed Gharahshiran, Yimin Zeng, et al.
Chemical Society Reviews (2024) Vol. 53, Iss. 11, pp. 5428-5488
Closed Access | Times Cited: 17
Molecular precursors for the electrodeposition of 2D-layered metal chalcogenides
Philip N. Bartlett, C.H. de Groot, Victoria K. Greenacre, et al.
Nature Reviews Chemistry (2025)
Closed Access | Times Cited: 2
Accurately Computed Dimerization Trends of ALD Precursors and Their Impact on Surface Reactivity in Area-Selective Atomic Layer Deposition
Patrick Maué, Émilie Chantraine, Fabian Pieck, et al.
Chemistry of Materials (2025)
Closed Access | Times Cited: 2
Molecular Design in Area-Selective Atomic Layer Deposition: Understanding Inhibitors and Precursors
Yujin Lee, Amnon Rothman, Alexander Shearer, et al.
Chemistry of Materials (2025)
Closed Access | Times Cited: 2
Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition
Josiah Yarbrough, Alexander Shearer, Stacey F. Bent
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2021) Vol. 39, Iss. 2
Open Access | Times Cited: 81
Fundamentals of atomic and close-to-atomic scale manufacturing: a review
Jian Gao, Xichun Luo, Fengzhou Fang, et al.
International Journal of Extreme Manufacturing (2021) Vol. 4, Iss. 1, pp. 012001-012001
Open Access | Times Cited: 78
Atomic Design and Fine-Tuning of Subnanometric Pt Catalysts to Tame Hydrogen Generation
Jie Yang, Wenzhao Fu, Chaoqiu Chen, et al.
ACS Catalysis (2021) Vol. 11, Iss. 7, pp. 4146-4156
Open Access | Times Cited: 58
Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies
Ivo Utke, Petra Swiderek, Katja Höflich, et al.
Coordination Chemistry Reviews (2022) Vol. 458, pp. 213851-213851
Open Access | Times Cited: 55
Atomic Layer Deposition—A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors
Mohd Zahid Ansari, Iftikhar Hussain, Debananda Mohapatra, et al.
Advanced Science (2023) Vol. 11, Iss. 1
Open Access | Times Cited: 41
Atomic Layer Deposition for Electrochemical Energy: from Design to Industrialization
Zhe Zhao, Gaoshan Huang, Ye Kong, et al.
Electrochemical Energy Reviews (2022) Vol. 5, Iss. S1
Closed Access | Times Cited: 39
Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations
Alfredo Mameli, Andrew V. Teplyakov
Accounts of Chemical Research (2023) Vol. 56, Iss. 15, pp. 2084-2095
Closed Access | Times Cited: 26
Theoretical Design Strategies for Area-Selective Atomic Layer Deposition
Miso Kim, Jiwon Kim, Sujin Kwon, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 11, pp. 5313-5324
Open Access | Times Cited: 14
Chemical Vapor Deposition of a Single-Crystalline MoS2 Monolayer through Anisotropic 2D Crystal Growth on Stepped Sapphire Surface
Iryna Kandybka, Benjamin Groven, Henry Medina, et al.
ACS Nano (2024) Vol. 18, Iss. 4, pp. 3173-3186
Closed Access | Times Cited: 13
Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Pengmei Yu, Marc J. M. Merkx, Ilker Tezsevin, et al.
Applied Surface Science (2024) Vol. 665, pp. 160141-160141
Open Access | Times Cited: 13
Area-selective atomic layer deposition on 2D monolayer lateral superlattices
Jeongwon Park, Seung Jae Kwak, Su-Min Kang, et al.
Nature Communications (2024) Vol. 15, Iss. 1
Open Access | Times Cited: 10
Towards integrated textile display systems
Zhen Wang, Yue Liu, Zihao Zhou, et al.
Nature Reviews Electrical Engineering (2024) Vol. 1, Iss. 7, pp. 466-477
Closed Access | Times Cited: 9
Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 Using Ethanethiol Inhibitor
Hyun Gu Kim, Miso Kim, Bonwook Gu, et al.
Chemistry of Materials (2020) Vol. 32, Iss. 20, pp. 8921-8929
Closed Access | Times Cited: 65
Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective
Eleanor Mullen, Michael A. Morris
Nanomaterials (2021) Vol. 11, Iss. 5, pp. 1085-1085
Open Access | Times Cited: 53
Role of Precursor Choice on Area-Selective Atomic Layer Deposition
Il‐Kwon Oh, Tania E. Sandoval, Tzu‐Ling Liu, et al.
Chemistry of Materials (2021) Vol. 33, Iss. 11, pp. 3926-3935
Closed Access | Times Cited: 52
Ordered mesoporous metal oxides for electrochemical applications: correlation between structure, electrical properties and device performance
Erdogan Celik, Yanjiao Ma, Torsten Brezesinski, et al.
Physical Chemistry Chemical Physics (2021) Vol. 23, Iss. 18, pp. 10706-10735
Open Access | Times Cited: 42
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
Marc J. M. Merkx, Athanasios Angelidis, Alfredo Mameli, et al.
The Journal of Physical Chemistry C (2022) Vol. 126, Iss. 10, pp. 4845-4853
Open Access | Times Cited: 38
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