
OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance
Jihoon Jeon, Taikyu Kim, Myoungsu Jang, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 7, pp. 3326-3333
Closed Access | Times Cited: 6
Jihoon Jeon, Taikyu Kim, Myoungsu Jang, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 7, pp. 3326-3333
Closed Access | Times Cited: 6
Showing 6 citing articles:
Improvement of Interfacial Electrical Properties of Au/ZrO2/Al2O3/TiN Capacitors by Reduction Effect of Ar Plasma Treatment
Hyeongjun Kim, Heqing Yang, Woongkyu Lee
Ceramics International (2025)
Closed Access | Times Cited: 2
Hyeongjun Kim, Heqing Yang, Woongkyu Lee
Ceramics International (2025)
Closed Access | Times Cited: 2
Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness Limitations
Taeseok Kim, Han Kim, Seung Ho Ryu, et al.
Chemistry of Materials (2025)
Closed Access
Taeseok Kim, Han Kim, Seung Ho Ryu, et al.
Chemistry of Materials (2025)
Closed Access
Improved corrosion resistance and electrical characteristics of titanium, with atomic layer deposited (ALD) TiOx coating
Kesong Wang, Adam Paxson, Thomas Valdez, et al.
Applied Surface Science (2025), pp. 162719-162719
Open Access
Kesong Wang, Adam Paxson, Thomas Valdez, et al.
Applied Surface Science (2025), pp. 162719-162719
Open Access
Atomic layer deposition of Ru/rutile Al-TiO2/Ru layer stacks for high-performance silicon capacitors
Taehyun Kim, Dong-Hwan Lim, Hyeongjun Kim, et al.
Materials Science in Semiconductor Processing (2025) Vol. 195, pp. 109646-109646
Closed Access
Taehyun Kim, Dong-Hwan Lim, Hyeongjun Kim, et al.
Materials Science in Semiconductor Processing (2025) Vol. 195, pp. 109646-109646
Closed Access
Metastable Rutile TiO2 Growth on Non‐Lattice‐Matched Substrates via a Sacrificial Layer Strategy
Jihoon Jeon, Myoungsu Jang, S. H. Ye, et al.
Small (2025)
Closed Access
Jihoon Jeon, Myoungsu Jang, S. H. Ye, et al.
Small (2025)
Closed Access
“Grafting to” Rubber Composite for Elastic Dielectric Material
Dinda Bazliah, Qi‐An Hong, Livy Laysandra, et al.
Macromolecular Chemistry and Physics (2024)
Closed Access
Dinda Bazliah, Qi‐An Hong, Livy Laysandra, et al.
Macromolecular Chemistry and Physics (2024)
Closed Access