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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review
Adriaan J. M. Mackus, Joel R. Schneider, Callisto MacIsaac, et al.
Chemistry of Materials (2018) Vol. 31, Iss. 4, pp. 1142-1183
Closed Access | Times Cited: 234

Showing 1-25 of 234 citing articles:

Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
Gregory N. Parsons, Robert D. Clark
Chemistry of Materials (2020) Vol. 32, Iss. 12, pp. 4920-4953
Closed Access | Times Cited: 266
Atomic layer deposition and other thin film deposition techniques: from principles to film properties
James Ayodele Oke, Tien‐Chien Jen
Journal of Materials Research and Technology (2022) Vol. 21, pp. 2481-2514
Open Access | Times Cited: 91
Advances in Atomic Layer Deposition
Jingming Zhang, Yicheng Li, Kun Cao, et al.
Nanomanufacturing and Metrology (2022) Vol. 5, Iss. 3, pp. 191-208
Open Access | Times Cited: 77
Emerging Atomic Layer Deposition for the Development of High-Performance Lithium-Ion Batteries
Sina Karimzadeh, Babak Safaei, Chris Yuan, et al.
Electrochemical Energy Reviews (2023) Vol. 6, Iss. 1
Open Access | Times Cited: 75
Interface engineering of inorganic solid‐state lithium batteries via atomic and molecular layer deposition
Huaihu Sun, Hongliu Dai, Gaixia Zhang, et al.
InfoMat (2025)
Open Access | Times Cited: 2
Electrostatic and Electronic Effects on Doped Nickel Oxide Nanofilms for Water Oxidation
Ina Østrøm, Marco Favaro, Moein Seyfouri, et al.
Journal of the American Chemical Society (2025)
Closed Access | Times Cited: 2
Opportunities for Atomic Layer Deposition in Emerging Energy Technologies
Arun S. Asundi, James A. Raiford, Stacey F. Bent
ACS Energy Letters (2019) Vol. 4, Iss. 4, pp. 908-925
Closed Access | Times Cited: 99
Consistency and reproducibility in atomic layer deposition
Henrik H. Sønsteby, Angel Yanguas‐Gil, Jeffrey W. Elam
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2020) Vol. 38, Iss. 2
Open Access | Times Cited: 87
Cold plasma treatment of catalytic materials: a review
Lanbo Di, Jingsen Zhang, Xiuling Zhang, et al.
Journal of Physics D Applied Physics (2021) Vol. 54, Iss. 33, pp. 333001-333001
Closed Access | Times Cited: 86
Water treatment based on atomically engineered materials: Atomic layer deposition and beyond
Xiaobin Yang, Alex B. F. Martinson, Jeffrey W. Elam, et al.
Matter (2021) Vol. 4, Iss. 11, pp. 3515-3548
Open Access | Times Cited: 86
SILAR Deposition of Metal Oxide Nanostructured Films
Samantha Prabath Ratnayake, Jiawen Ren, Elena Colusso, et al.
Small (2021) Vol. 17, Iss. 49
Open Access | Times Cited: 85
Atomic level deposition to extend Moore’s law and beyond
Rong Chen, Yicheng Li, Jiaming Cai, et al.
International Journal of Extreme Manufacturing (2020) Vol. 2, Iss. 2, pp. 022002-022002
Open Access | Times Cited: 74
Recent Advances in Materials Design Using Atomic Layer Deposition for Energy Applications
Bikesh Gupta, Md. Anower Hossain, Asim Riaz, et al.
Advanced Functional Materials (2021) Vol. 32, Iss. 3
Closed Access | Times Cited: 64
Thermoelectric Silver‐Based Chalcogenides
Si Yin Tee, Daniel Ponsford, Chee Leng Lay, et al.
Advanced Science (2022) Vol. 9, Iss. 36
Open Access | Times Cited: 58
Atomic layer deposition of thin films: from a chemistry perspective
Jinxiong Li, Gaoda Chai, Xinwei Wang
International Journal of Extreme Manufacturing (2023) Vol. 5, Iss. 3, pp. 032003-032003
Open Access | Times Cited: 42
Atomic layer deposition of conductive and semiconductive oxides
Bart Macco, W. M. M. Kessels
Applied Physics Reviews (2022) Vol. 9, Iss. 4
Open Access | Times Cited: 39
Atomic Layer Deposition for Electrochemical Energy: from Design to Industrialization
Zhe Zhao, Gaoshan Huang, Ye Kong, et al.
Electrochemical Energy Reviews (2022) Vol. 5, Iss. S1
Closed Access | Times Cited: 39
Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices
Ae Rim Choi, Dong Hyun Lim, So‐Yeon Shin, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 5, pp. 2194-2219
Closed Access | Times Cited: 12
Atomic Layer Deposition Films for Resistive Random‐Access Memories
Chunxue Hao, Jun Peng, Robert Zierold, et al.
Advanced Materials Technologies (2024) Vol. 9, Iss. 16
Open Access | Times Cited: 9
Atomic layer deposition enabling higher efficiency solar cells: A review
Md. Anower Hossain, Kean Thong Khoo, Xin Cui, et al.
Nano Materials Science (2019) Vol. 2, Iss. 3, pp. 204-226
Open Access | Times Cited: 75
Review Article: Atomic layer deposition of doped ZnO films
Zhengning Gao, Parag Banerjee
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2019) Vol. 37, Iss. 5
Open Access | Times Cited: 69
Atomic layer deposition of solid-state electrolytes for next-generation lithium-ion batteries and beyond: Opportunities and challenges
Xiangbo Meng
Energy storage materials (2020) Vol. 30, pp. 296-328
Open Access | Times Cited: 65
Atomic layer deposition of functional multicomponent oxides
Mariona Coll, Mari Napari
APL Materials (2019) Vol. 7, Iss. 11
Open Access | Times Cited: 59
Characterization of Al Incorporation into HfO2 Dielectric by Atomic Layer Deposition
Md. Mamunur Rahman, Jun-Gyu Kim, Dae-Hyun Kim, et al.
Micromachines (2019) Vol. 10, Iss. 6, pp. 361-361
Open Access | Times Cited: 55
Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS
Mariana Amorim Fraga, Rodrigo Sávio Pessoa
Micromachines (2020) Vol. 11, Iss. 9, pp. 799-799
Open Access | Times Cited: 54
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