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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
Julia D. Lenef, Jaesung Jo, Orlando Trejo, et al.
The Journal of Physical Chemistry C (2021) Vol. 125, Iss. 17, pp. 9383-9390
Closed Access | Times Cited: 26

Showing 1-25 of 26 citing articles:

Synthesis of Binary Metal Doped CuO Nanoarchitecture for Congo red dye Removal: Synergistic Effects of Adsorption and Mineralization Techniques
Riyadh H. Alshammari, Muhammad Aadil, Tehmina Kousar, et al.
Optical Materials (2023) Vol. 144, pp. 114314-114314
Closed Access | Times Cited: 37
IGZO-Based Electronic Device Application: Advancements in Gas Sensor, Logic Circuit, Biosensor, Neuromorphic Device, and Photodetector Technologies
Young-Min Han, Juhyung Seo, Dong Hyun Lee, et al.
Micromachines (2025) Vol. 16, Iss. 2, pp. 118-118
Open Access | Times Cited: 1
α‐TeO2 Oxide as Transparent p‐Type Semiconductor for Low Temperature Processed Thin Film Transistor Devices
Nehru Devabharathi, Sandeep Yadav, Inga Dönges, et al.
Advanced Materials Interfaces (2024) Vol. 11, Iss. 16
Open Access | Times Cited: 7
Recent progress and perspectives on atomic‐layer‐deposited semiconducting oxides for transistor applications
Min Hoe Cho, Cheol Hee Choi, Jae Kyeong Jeong
Journal of the Society for Information Display (2022) Vol. 30, Iss. 3, pp. 175-197
Closed Access | Times Cited: 23
A review on ternary CuFeS2 compound: Fabrication strategies and applications
Bhoomi S. Shah, Jolly B. Raval, Deepak Kumar, et al.
Journal of Alloys and Compounds (2022) Vol. 938, pp. 168566-168566
Closed Access | Times Cited: 22
Recent Progress and Perspectives of Field‐Effect Transistors Based on p‐Type Oxide Semiconductors
Taikyu Kim, Jae Kyeong Jeong
physica status solidi (RRL) - Rapid Research Letters (2021) Vol. 16, Iss. 1
Closed Access | Times Cited: 26
Atmospheric Pressure Spatial Atomic Layer Deposition of p-type CuO thin films from copper (II) acetylacetonate and ozone for UV detection
Hien Vu, Khang D. Pham, Hang Tran Thi My, et al.
Dalton Transactions (2025)
Closed Access
Optoelectronic properties of CuO deposited by plasma-enhanced atomic layer deposition
Anne Haggrén, Gabriel Bartholazzi, Lachlan J. Watson, et al.
Vacuum (2025), pp. 114075-114075
Open Access
Direct current sputter deposited CuO layers on conductive glass: towards a maximum photoelectrochemical response of photocathodes
Hyesung Kim, Patrik Schmuki
Thin Solid Films (2025), pp. 140655-140655
Open Access
Selective spatial atomic layer deposition of Cu, Cu2O, and CuO thin films in the open air: reality or fiction?
Abderrahime Sekkat, Matthieu Weber, Jesús López‐Sánchez, et al.
Materials Today Chemistry (2023) Vol. 29, pp. 101431-101431
Open Access | Times Cited: 9
TMDC-based hybrid photocatalyst for antibiotics degradation: A comprehensive review
Nidhin Francis, Yogesh S. Choudhary, Thomas Abraham, et al.
FlatChem (2024) Vol. 45, pp. 100653-100653
Closed Access | Times Cited: 3
Removal of Methyl Green by CuO/COF Photocatalysts with Enhanced Adsorption and Photocatalytic Activity
Aijuan Wang, Xiaping Chen, Hua Tang, et al.
ChemistrySelect (2024) Vol. 9, Iss. 47
Closed Access | Times Cited: 3
Integrating Structural Colors with Additive Manufacturing Using Atomic Layer Deposition
Benjamin A. Rorem, Tae‐Hee Cho, Nazanin Farjam, et al.
ACS Applied Materials & Interfaces (2022) Vol. 14, Iss. 27, pp. 31099-31108
Closed Access | Times Cited: 12
Development of antibacterial neural stimulation electrodes via hierarchical surface restructuring and atomic layer deposition
Henna Khosla, Wesley Seche, Daniel Ammerman, et al.
Scientific Reports (2023) Vol. 13, Iss. 1
Open Access | Times Cited: 4
Recent Progress of Solution‐Processed Copper‐based p‐Channel Thin‐Film Transistors
Hala Al-Jawhari
Advanced Electronic Materials (2021) Vol. 8, Iss. 3
Closed Access | Times Cited: 10
Low-Frequency Noise Related to the Scattering Effect in p-Type Copper(I) Oxide Thin-Film Transistors
Jaewook Yoo, Seohyeon Park, Hongseung Lee, et al.
ACS Applied Materials & Interfaces (2024)
Closed Access | Times Cited: 1
Solution-Processed Copper Iodide Film as a p-Type Electrical Conductor and Their Applications
Han Ju Lee, Minsu Park, Seonjeong Lee, et al.
ACS Applied Electronic Materials (2022) Vol. 4, Iss. 3, pp. 1232-1237
Closed Access | Times Cited: 6
Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange
Julia D. Lenef, Andrew J. Gayle, Jaesung Jo, et al.
Chemistry of Materials (2023) Vol. 35, Iss. 6, pp. 2503-2517
Closed Access | Times Cited: 3
Data-Driven Predetermination of Cu Oxidation State in Copper Nanoparticles: Application to the Synthesis by Laser Ablation in Liquid
Runpeng Miao, Michael Bissoli, Andrea Basagni, et al.
Journal of the American Chemical Society (2023) Vol. 145, Iss. 47, pp. 25737-25752
Open Access | Times Cited: 3
SeO2Microwires Designed as Low‐Temperature Abrupt Microelectronic Switches, Negative Resistance, and Negative Dielectric Constant Sources
A. F. Qasrawi, Wala S. Ghannam
physica status solidi (a) (2022) Vol. 219, Iss. 24
Closed Access | Times Cited: 5
Recent progress of the p-type oxide thin films for transistor applications: Nickel oxide, Tin oxide, and Copper oxide
Minki Choe, Dahui Jeon, Inhong Hwang, et al.
Ceramist (2023) Vol. 26, Iss. 1, pp. 75-89
Open Access | Times Cited: 1
Synthesis and comparison of copper precursor using aminoalkoxide for copper containing thin films and nanomaterials
Haesun Kim, Yurim Mo, Sunyoung Shin, et al.
Journal of Organometallic Chemistry (2024) Vol. 1020, pp. 123347-123347
Closed Access
Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review
Inhong Hwang, Minki Choe, Dahui Jeon, et al.
Journal of Materials Chemistry C (2024) Vol. 12, Iss. 45, pp. 18167-18200
Closed Access
Monolithic three-dimensional integration with 2D material-based p-type transistors
Taoyu Zou, Youjin Reo, Seongmin Heo, et al.
Materials Science and Engineering R Reports (2024) Vol. 163, pp. 100893-100893
Closed Access
Tuning the selectivity of bimetallic Cu electrocatalysts for CO2 reduction using atomic layer deposition
Si Young Lee, Julia D. Lenef, Daniel O. Delgado Cornejo, et al.
Chemical Communications (2024)
Open Access
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