OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Expeditiously Crystallized Pure Orthorhombic-Hf0.5Zr0.5O2for Negative Capacitance Field Effect Transistors
Haewon Cho, Pavan Pujar, Minsu Choi, et al.
ACS Applied Materials & Interfaces (2021) Vol. 13, Iss. 50, pp. 60250-60260
Closed Access | Times Cited: 8
Haewon Cho, Pavan Pujar, Minsu Choi, et al.
ACS Applied Materials & Interfaces (2021) Vol. 13, Iss. 50, pp. 60250-60260
Closed Access | Times Cited: 8
Showing 8 citing articles:
Optical Enhancement of Indirect Bandgap 2D Transition Metal Dichalcogenides for Multi‐Functional Optoelectronic Sensors
Riya Dutta, Arindam Bala, Anamika Sen, et al.
Advanced Materials (2023) Vol. 35, Iss. 46
Closed Access | Times Cited: 57
Riya Dutta, Arindam Bala, Anamika Sen, et al.
Advanced Materials (2023) Vol. 35, Iss. 46
Closed Access | Times Cited: 57
Eliminating Ferroelectric Hysteresis in All-Two-Dimensional Gate-Stack Negative-Capacitance Transistors
Hui Quan, Dehuan Meng, Xuezhou Ma, et al.
ACS Applied Materials & Interfaces (2023) Vol. 15, Iss. 38, pp. 45076-45082
Closed Access | Times Cited: 7
Hui Quan, Dehuan Meng, Xuezhou Ma, et al.
ACS Applied Materials & Interfaces (2023) Vol. 15, Iss. 38, pp. 45076-45082
Closed Access | Times Cited: 7
Effects of plasma power on ferroelectric properties of HfO2-ZrO2 nanolaminates produced by plasma enhanced atomic layer deposition
Yeonghwan Ahn, Yerin Jeon, Seokwon Lim, et al.
Surfaces and Interfaces (2023) Vol. 37, pp. 102669-102669
Closed Access | Times Cited: 6
Yeonghwan Ahn, Yerin Jeon, Seokwon Lim, et al.
Surfaces and Interfaces (2023) Vol. 37, pp. 102669-102669
Closed Access | Times Cited: 6
Phases in HfO2-Based Ferroelectric Thin Films and Their Integration in Low-Power Devices
Pavan Pujar, Haewon Cho, Sunkook Kim
ACS Applied Electronic Materials (2023) Vol. 5, Iss. 1, pp. 11-20
Closed Access | Times Cited: 5
Pavan Pujar, Haewon Cho, Sunkook Kim
ACS Applied Electronic Materials (2023) Vol. 5, Iss. 1, pp. 11-20
Closed Access | Times Cited: 5
Van der Waals Multilayered Films: Wafer‐Scale Synthesis and Applications in Electronics and Optoelectronics
Seok Joon Yun, Hayoung Ko, Sunny Park, et al.
Advanced Functional Materials (2024)
Closed Access | Times Cited: 1
Seok Joon Yun, Hayoung Ko, Sunny Park, et al.
Advanced Functional Materials (2024)
Closed Access | Times Cited: 1
Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory
Da Hee Hong, Jae Hoon Yoo, Won Ji Park, et al.
Nanomaterials (2023) Vol. 13, Iss. 5, pp. 900-900
Open Access | Times Cited: 3
Da Hee Hong, Jae Hoon Yoo, Won Ji Park, et al.
Nanomaterials (2023) Vol. 13, Iss. 5, pp. 900-900
Open Access | Times Cited: 3
Observation of stabilized negative capacitance effect in hafnium-based ferroic films
Leilei Qiao, Ruiting Zhao, Cheng Song, et al.
Materials Futures (2023) Vol. 3, Iss. 1, pp. 011001-011001
Open Access | Times Cited: 2
Leilei Qiao, Ruiting Zhao, Cheng Song, et al.
Materials Futures (2023) Vol. 3, Iss. 1, pp. 011001-011001
Open Access | Times Cited: 2
The Potential of ferroelectric HfO2 for Next-Generation Memory Device: Ferroelectric Properties and Applications
Myeong Seop Song, Seung Chul Chae
Ceramist (2023) Vol. 26, Iss. 1, pp. 121-137
Open Access
Myeong Seop Song, Seung Chul Chae
Ceramist (2023) Vol. 26, Iss. 1, pp. 121-137
Open Access
