OpenAlex Citation Counts

OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Atomic Layer Growth of Rutile TiO₂ Films with Ultrahigh Dielectric Constants via Crystal Orientation Engineering
Taikyu Kim, Jihoon Jeon, Seung Ho Ryu, et al.
ACS Applied Materials & Interfaces (2024) Vol. 16, Iss. 26, pp. 33877-33884
Closed Access | Times Cited: 7

Showing 7 citing articles:

Improvement of Interfacial Electrical Properties of Au/ZrO2/Al2O3/TiN Capacitors by Reduction Effect of Ar Plasma Treatment
Hyeongjun Kim, Heqing Yang, Woongkyu Lee
Ceramics International (2025)
Closed Access | Times Cited: 2

Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness Limitations
Taeseok Kim, Han Kim, Seung Ho Ryu, et al.
Chemistry of Materials (2025)
Closed Access

Improved corrosion resistance and electrical characteristics of titanium, with atomic layer deposited (ALD) TiOx coating
Kesong Wang, Adam Paxson, Thomas Valdez, et al.
Applied Surface Science (2025), pp. 162719-162719
Open Access

Tuning electrical performances of ALD TiO2-based thin film capacitor by Ar/O2 plasma-based atomic layer annealing
Geongu Han, Seunghyeon Lee, Geonwoo Park, et al.
Surface and Coatings Technology (2025) Vol. 503, pp. 132014-132014
Closed Access

Atomic layer deposition of Ru/rutile Al-TiO2/Ru layer stacks for high-performance silicon capacitors
Taehyun Kim, Dong-Hwan Lim, Hyeongjun Kim, et al.
Materials Science in Semiconductor Processing (2025) Vol. 195, pp. 109646-109646
Closed Access

Metastable Rutile TiO₂ Growth on Non‐Lattice‐Matched Substrates via a Sacrificial Layer Strategy
Jihoon Jeon, Myoungsu Jang, S. H. Ye, et al.
Small (2025)
Closed Access

Thin films as practical quantum materials: A status quo and beyond
Chengyong Ha, Yoon Jang Chung
APL Materials (2024) Vol. 12, Iss. 12
Open Access | Times Cited: 3

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Requested Article:

Showing 7 citing articles:

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