OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Atomic layer deposition of conductive and semiconductive oxides
Bart Macco, W. M. M. Kessels
Applied Physics Reviews (2022) Vol. 9, Iss. 4
Open Access | Times Cited: 39

Showing 1-25 of 39 citing articles:

Terahertz nanoscopy: Advances, challenges, and the road ahead
Xiao Guo, Karl Bertling, Bogdan C. Donose, et al.
Applied Physics Reviews (2024) Vol. 11, Iss. 2
Open Access | Times Cited: 19

Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices
Ae Rim Choi, Dong Hyun Lim, So‐Yeon Shin, et al.
Chemistry of Materials (2024) Vol. 36, Iss. 5, pp. 2194-2219
Closed Access | Times Cited: 12

In Situ IR Spectroscopy Studies of Atomic Layer-Deposited SnO2 on Formamidinium-Based Lead Halide Perovskite
Andrea Bracesco, Jarvi W. P Jansen, Haibo Xue, et al.
ACS Applied Materials & Interfaces (2023) Vol. 15, Iss. 31, pp. 38018-38028
Open Access | Times Cited: 18

Impact of atomic layer deposition temperature on electrical and optical properties of ZnO:Al films
Ivan Masmitjà Rusiñol, Pau Estarlich, Gema López, et al.
Journal of Science Advanced Materials and Devices (2024) Vol. 9, Iss. 2, pp. 100698-100698
Open Access | Times Cited: 4

C-Axis Aligned Composite InZnO via Thermal Atomic Layer Deposition for 3D Nanostructured Semiconductor
Hye‐Mi Kim, Seong‐Hwan Ryu, Sang‐Wook Kim, et al.
ACS Applied Materials & Interfaces (2024) Vol. 16, Iss. 12, pp. 14995-15003
Closed Access | Times Cited: 4

Atomic layer deposition of crystalline molybdenum trioxide and suboxide thin films using molybdenum(II) acetate dimer precursor
Alexey Ganzhinov, Miika Mattinen, Kenichiro Mizohata, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 2
Closed Access

Nanoconfinement Effects in Electrocatalysis and Photocatalysis
Chuanbiao Bie, Jindi Yang, Xiangkang Zeng, et al.
Small (2025)
Open Access

Atomic layer deposited zinc promoted copper catalysts for carbon dioxide hydrogenation to methanol: influence of support
Aitor Arandia, Jorge Velasco, Ahmed Sajid, et al.
Catalysis Today (2025), pp. 115283-115283
Open Access

Typical applications and perspectives of machine learning for advanced precision machining: A comprehensive review
Yiji Liang, Canwen Dai, Jingwei Wang, et al.
Expert Systems with Applications (2025), pp. 127770-127770
Closed Access

Ternary amorphous oxide semiconductor of In–Ga–O system for three-dimensional integrated device application
Takanori Takahashi, Mutsunori Uenuma, Masaharu Kobayashi, et al.
APL Materials (2025) Vol. 13, Iss. 5
Open Access

Stabilization of top-gate p-SnO transistors via ultrathin Al2O3 interlayers for hysteresis-free operation
Minki Choe, Seung Ho Ryu, Jihoon Jeon, et al.
Journal of Materials Chemistry C (2025)
Closed Access

Exploring the Potential of InCp Precursor in Plasma-Enhanced Atomic Layer Deposition for High-Performance IZO-TFTs
Haohan Lei, Miao Xu, Hua Xu, et al.
IEEE Transactions on Electron Devices (2024) Vol. 71, Iss. 6, pp. 3659-3664
Closed Access | Times Cited: 3

Titanium Dioxide: A Versatile Earth‐Abundant Optical Material for Photovoltaics
Eloy J. Marcelis, Johan E. ten Elshof, Monica Morales‐Masis
Advanced Optical Materials (2024)
Open Access | Times Cited: 3

Epitaxial films and devices of transparent conducting oxides: La:BaSnO3
Prosper Ngabonziza, Arnaud P. Nono Tchiomo
APL Materials (2024) Vol. 12, Iss. 12
Open Access | Times Cited: 3

Nonlinear optics at epsilon near zero: From origins to new materials
Dhruv Fomra, Adam Ball, Samprity Saha, et al.
Applied Physics Reviews (2024) Vol. 11, Iss. 1
Closed Access | Times Cited: 3

Exchange Reactions during Atomic Layer Deposition of Ternary Group 13 Oxides and Nitrides
Iaan Cho, Bonggeun Shong
ACS Applied Electronic Materials (2024)
Closed Access | Times Cited: 2

Crystallinity‐controlled volatility tuning of ZrO2 memristor for physical reservoir computing
Dae Kyu Lee, Gichang Noh, Seungmin Oh, et al.
InfoMat (2024)
Open Access | Times Cited: 2

Study of silicon surface passivation by ZnOx/AlOx stack prepared using super-cycle approach in thermal ALD process
Abhishek Kumar, Meenakshi Devi, Shweta Tomer, et al.
Surfaces and Interfaces (2024) Vol. 47, pp. 104127-104127
Closed Access | Times Cited: 2

Crystallization Disruption via Atomic Layer Deposition Substitutional Dopant Scheduling: High-Mobility Amorphous Indium Zinc Tin Oxide
Mark Muir, Jacob E. Kupferberg, Jessica C. Jones, et al.
ACS Applied Optical Materials (2024) Vol. 2, Iss. 5, pp. 877-884
Closed Access | Times Cited: 2

Surface passivation approaches for silicon, germanium, and III–V semiconductors
Roel J. Theeuwes, W. M. M. Kessels, Bart Macco
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Closed Access | Times Cited: 2

High-performance tin oxide field-effect transistors deposited by thermal atomic layer deposition
Chanhyeok Park, Seon-Chang Kim, Dawon Lee, et al.
Materials Today Communications (2023) Vol. 37, pp. 107064-107064
Closed Access | Times Cited: 4

High-performance ultrathin solution-processed SnO2 top-gate thin-film transistors by constructing high-quality dielectric/channel interface
Fenglan Kuang, Jinxuan Wang, Jun Zhao, et al.
Surfaces and Interfaces (2024) Vol. 48, pp. 104333-104333
Closed Access | Times Cited: 1

Unveiling growth mechanisms of PEALD In2O3 thin films with amide-based versus alkyl-based novel indium precursors
Gyeong Min Jeong, Hae Lin Yang, Ara Yoon, et al.
Journal of Materials Chemistry C (2024) Vol. 12, Iss. 28, pp. 10575-10584
Closed Access | Times Cited: 1

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