OpenAlex Citation Counts

OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Roadmap on ferroelectric hafnia- and zirconia-based materials and devices
José Silva, Ruben Alcala, Uygar E. Avci, et al.
APL Materials (2023) Vol. 11, Iss. 8
Open Access | Times Cited: 62

Showing 1-25 of 62 citing articles:

Review of Ferroelectric Materials and Devices toward Ultralow Voltage Operation
Aiji Wang, Rui Chen, Yun Yu, et al.
Advanced Functional Materials (2025)
Closed Access | Times Cited: 3

Perspectives and progress on wurtzite ferroelectrics: Synthesis, characterization, theory, and device applications
Joseph Casamento, Steven M. Baksa, Drew Behrendt, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 8
Open Access | Times Cited: 9

Pressure-Driven Polar Orthorhombic to Tetragonal Phase Transition in Hafnia at Room Temperature
J. L. Musfeldt, Sobhit Singh, K. Smith, et al.
Chemistry of Materials (2025) Vol. 37, Iss. 5, pp. 1820-1825
Open Access | Times Cited: 1

Oxygen vacancies stabilized 180° charged domain walls in ferroelectric hafnium oxide
Zhongshan Xu, Xiaona Zhu, Guodong Zhao, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 1
Closed Access | Times Cited: 8

Modulation of Oxygen Content and Ferroelectricity in Sputtered Hafnia‐Zirconia by Engineering of Tungsten Oxide Bottom Electrodes
Xuetao Wang, Stefan Slesazeck, Thomas Mikolajick, et al.
Advanced Electronic Materials (2024) Vol. 10, Iss. 6
Closed Access | Times Cited: 6

Multi-state nonvolatile capacitances in HfO2-based ferroelectric capacitor for neuromorphic computing
Shuyu Wu, Xumeng Zhang, Rongrong Cao, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 10
Closed Access | Times Cited: 6

Transistors with ferroelectric ZrXAl1−XOY crystallized by ZnO growth for multi-level memory and neuromorphic computing
Md Mobaidul Islam, Arqum Ali, Chanju Park, et al.
Communications Materials (2024) Vol. 5, Iss. 1
Open Access | Times Cited: 5

Mitigation of field-driven dynamic phase evolution in ferroelectric Hf0.5Zr0.5O2 films by adopting oxygen-supplying electrode
Young-Hwan Lee, Se Hyun Kim, Hyun Woo Jeong, et al.
Applied Surface Science (2023) Vol. 648, pp. 158948-158948
Closed Access | Times Cited: 11

Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films
Liron Shvilberg, Chuanzhen Zhou, Megan K. Lenox, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 25
Closed Access | Times Cited: 4

Dual Ferroelectric Polarization and Dielectric Response Improvement in Epitaxial Hf_0.5Zr_0.5O₂/HfO₂ Nanolaminates
Mehrdad Ghiasabadi Farahani, Alberto Quintana, Tingfeng Song, et al.
ACS Applied Materials & Interfaces (2025)
Closed Access

A review of hafnium-based ferroelectrics for advanced computing
Xiangdong Xu, Z. Luo, Huabin Sun, et al.
Solid-State Electronics (2025), pp. 109053-109053
Closed Access

Intrinsic threshold electric field for domain wall motion in ferroelectrics based on a discretized phase-field model
Huanhuan Tian, Jianguo Yang, Ming Liu
Physical review. B./Physical review. B (2025) Vol. 111, Iss. 6
Closed Access

Oxygen vacancy distribution and phase composition in scaled, Hf0.5Zr0.5O2-based ferroelectric capacitors
Thierry Iung, Lucía Pérez Ramírez, Andrei Gloskovskii, et al.
Applied Physics Letters (2025) Vol. 126, Iss. 6
Closed Access

Discrete Ferroelectric Polarization Switching in Nanoscale Oxide-Channel Ferroelectric Field-Effect Transistors
Yanjie Shao, Elham Rafie Borujeny, Jorge Fidalgo, et al.
Nano Letters (2025)
Closed Access

Ferroelectric Compensation Effect of the Hard Electrode for the HfO₂‐ZrO₂ Superlattice Films at the Low‐Annealing Temperature
Chuqian Zhu, Na Bai, Yufan Wang, et al.
Advanced Electronic Materials (2025)
Open Access

Ferroelectric Al_1‐xSc_xN Opposite State Retention Model Based on Switching Dynamics
Roberto Guido, Maike Gremmel, Thomas Mikolajick, et al.
Advanced Functional Materials (2025)
Closed Access

Coercive Field Control in Epitaxial Ferroelectric Hf_0.5Zr_0.5O₂ Thin Films by Nanostructure Engineering
J. Kim, Nives Strkalj, Alexandre Silva, et al.
ACS Applied Materials & Interfaces (2025)
Open Access

Unlocking the phase evolution of the hidden non-polar to ferroelectric transition in HfO2-based bulk crystals
Shuxian Wang, Yihao Shen, Xiaoyu Yang, et al.
Nature Communications (2025) Vol. 16, Iss. 1
Open Access

Ab Initio Study on 3D Anisotropic Ferroelectric Switching Mechanism and Coercive Field in HfO₂ and ZrO₂
Kun Hee Ye, Tae-Young Jeong, Seungjae Yoon, et al.
Advanced Functional Materials (2025)
Closed Access

Comprehensive Reliability Assessment of 32Gb (Hf,Zr)O₂-Based Ferroelectric NVDRAM
D. P. Ettisserry, A. Visconti, M. Bonanomi, et al.
2022 IEEE International Reliability Physics Symposium (IRPS) (2024), pp. 1-8
Closed Access | Times Cited: 3

Exploring tungsten-oxygen vacancy synergy: Impact on leakage characteristics in Hf0.5Zr0.5O2 ferroelectric thin films
Xuepei Wang, Maokun Wu, Ting Zhang, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 23
Closed Access | Times Cited: 3

Optimization of the 4 nm-Thick Hf_1–xZr_xO₂ Film with Low Operating Voltage and High Endurance for Ferroelectric Random Access Memory
Han Sol Park, Seungheon Choi, Kyung Do Kim, et al.
ACS Applied Electronic Materials (2024)
Closed Access | Times Cited: 3

Roadmap on low-power electronics
R. Ramesh, Sayeef Salahuddin, Suman Datta, et al.
APL Materials (2024) Vol. 12, Iss. 9
Open Access | Times Cited: 3

Photo-ferroelectric oxides for photovoltaic applications: Insights, challenges and opportunities
Abderrazzak Ait Bassou, F. Figueiras, José R. Fernandes, et al.
Applied Materials Today (2024) Vol. 41, pp. 102465-102465
Open Access | Times Cited: 3

Ultra‐Sensitive, Self‐powered, CMOS‐Compatible Near‐Infrared Photodetectors for Wide‐Ranging Applications
Nuno E. Silva, K.C. Sekhar, Adrian Kaim, et al.
Advanced Functional Materials (2024)
Open Access | Times Cited: 3

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Requested Article:

Showing 1-25 of 62 citing articles:

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