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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Atomic layer deposition of thin films: from a chemistry perspective
Jinxiong Li, Gaoda Chai, Xinwei Wang
International Journal of Extreme Manufacturing (2023) Vol. 5, Iss. 3, pp. 032003-032003
Open Access | Times Cited: 42

Showing 1-25 of 42 citing articles:

Oriented and Area-Selective Growth of Zeolitic Imidazolate Framework-8 Films by Molecular Layer Deposition
Jorid Smets, Víctor Rubio‐Giménez, Jesús Gándara-Loe, et al.
Chemistry of Materials (2025)
Closed Access | Times Cited: 3
A cost-effective strategy to synthesize perovskite holmium doped LaFeO3 and its composite with CNTs for wastewater treatment
Muhammad Farooq Warsi, Ayesha Ihsan, Fatimah Mohammed Alzahrani, et al.
Materials Science and Engineering B (2024) Vol. 301, pp. 117181-117181
Closed Access | Times Cited: 17
Nanomaterials for Flexible Neuromorphics
Guanglong Ding, Hang Li, Jiyu Zhao, et al.
Chemical Reviews (2024) Vol. 124, Iss. 22, pp. 12738-12843
Closed Access | Times Cited: 15
Applications of low-valent compounds with heavy group-14 elements
Ruksana Akhtar, Kumar Gaurav, Shabana Khan
Chemical Society Reviews (2024) Vol. 53, Iss. 12, pp. 6150-6243
Closed Access | Times Cited: 14
Advanced Deposition Techniques
Tahir Iqbal, Sumera Afsheen, Sabah Kausar
(2025), pp. 161-187
Closed Access | Times Cited: 1
Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐Deposited Indium Oxide Thin‐Film Transistors Enabled by Plasma Fluorination
Jinxiong Li, Shanshan Ju, Yupu Tang, et al.
Advanced Functional Materials (2024) Vol. 34, Iss. 28
Closed Access | Times Cited: 8
Fabrication and integration of photonic devices for phase-change memory and neuromorphic computing
Wen Zhou, Xueyang Shen, Xiaolong Yang, et al.
International Journal of Extreme Manufacturing (2023) Vol. 6, Iss. 2, pp. 022001-022001
Open Access | Times Cited: 15
Advances in solid-state batteries fabrication strategies for their manufacture
Tarekegn Heliso Dolla, Samuel O. Ajayi, Ludwe L. Sikeyi, et al.
Journal of Energy Storage (2024) Vol. 106, pp. 114737-114737
Open Access | Times Cited: 5
Material manufacturing from atomic layer
Xinwei Wang, Rong Chen, Shuhui Sun
International Journal of Extreme Manufacturing (2023) Vol. 5, Iss. 4, pp. 043001-043001
Open Access | Times Cited: 11
Preparation of single atom catalysts for high sensitive gas sensing
Xinxin He, Ping Guo, Xuyang An, et al.
International Journal of Extreme Manufacturing (2024) Vol. 6, Iss. 3, pp. 032007-032007
Open Access | Times Cited: 4
A Review of Coating Tin Oxide Electron Transport Layers for Optimizing the Performance of Perovskite Solar Cells.
Abubakar Sadiq Yusuf, Ahmed Alhaji Abubakar, Isah Kimpa Mohammed, et al.
Chemistry of Inorganic Materials (2025), pp. 100100-100100
Open Access
Review of Tribological Considerations in Solid Oxide Fuel Cells
A. Narayanasamy, Nurul Akidah Baharuddin, Afifah Z. Juri
Tribology International (2025), pp. 110641-110641
Closed Access
A comprehensive review on coating techniques to suppress the dendrites issue and improve the performance of lithium-ion batteries
Wajid Ali, Kyungtae Ko, Faheem Ahmed, et al.
Journal of Coatings Technology and Research (2025)
Closed Access
Atomic layer deposition paves the way for next-generation smart and functional textiles
Sijie Qiao, Zhicheng Shi, Aixin Tong, et al.
Advances in Colloid and Interface Science (2025) Vol. 341, pp. 103500-103500
Closed Access
Eliminating Nucleation Delay for Atomic Layer-Deposited Low-Defect Dense Multi-Component Thin Films through Preoccupation of Interstitial Sites
Guoping Su, Haoyan Chen, Honglong Ning, et al.
ACS Applied Materials & Interfaces (2025)
Closed Access
Atomic layer deposition on flexible polymeric materials for lithium-ion batteries
Edy Riyanto
RSC Advances (2025) Vol. 15, Iss. 16, pp. 12382-12401
Open Access
Critical outlook on separator layers for solid-state lithium batteries: Solid electrolyte materials, anode interface engineering, & scalable separator production
Diana Chaykina, Meena Ghosh, Ömer Ulaş Kudu
Journal of Power Sources (2025) Vol. 643, pp. 237014-237014
Open Access
Atomic Layer Deposition of PdRux Alloy Nanoparticles for Hydrogen Evolution Reaction Electrocatalysis in Acidic Media
Yu Liu, Tao‐Qing Zi, Yue Huang, et al.
ACS Applied Nano Materials (2025)
Closed Access
Investigation and Optimization of Process Parameters on Growth Rate in Al2O3 Atomic Layer Deposition (ALD) Using Statistical Approach
Dongqing Pan, Lei Yu
Materials (2025) Vol. 18, Iss. 9, pp. 1918-1918
Open Access
Advancements of Amorphous IGZO-Based Transistors: Materials, Processing, and Devices
Jae Young Kim, Hyunseong Kim, D.H Kim, et al.
ACS Applied Electronic Materials (2025)
Closed Access
The surface chemistry of the atomic layer deposition of metal thin films
Francisco Zaera
Nanotechnology (2024) Vol. 35, Iss. 36, pp. 362001-362001
Closed Access | Times Cited: 3
Nanostructured compliant interconnections for advanced Micro-Electronic packaging
Waqas Saeed, Zhongyu Liu, Rubin Yan, et al.
Materials & Design (2024) Vol. 244, pp. 113166-113166
Open Access | Times Cited: 3
Synthesis and application of graphdiyne-based materials for advanced chemical sensors
Na Zhao, Li Ji, Xiao Chang, et al.
Coordination Chemistry Reviews (2024) Vol. 521, pp. 216171-216171
Closed Access | Times Cited: 3
Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al2O3/HfO2/SiO2 and HfO2/Al2O3/SiO2 Trilayers for Ultraviolet Laser Applications
Zesheng Lin, Chen Song, Tianbao Liu, et al.
ACS Applied Materials & Interfaces (2024) Vol. 16, Iss. 24, pp. 31756-31767
Closed Access | Times Cited: 2
Two-step ALD process for non-oxide ceramic deposition: the example of boron nitride
Ali Hossain, Thomas Souvignet, Neil Innis, et al.
Journal of Physics Materials (2024) Vol. 7, Iss. 3, pp. 035006-035006
Open Access | Times Cited: 2
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