OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Future of plasma etching for microelectronics: Challenges and opportunities
G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, et al.
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2024) Vol. 42, Iss. 4
Open Access | Times Cited: 20
G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, et al.
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2024) Vol. 42, Iss. 4
Open Access | Times Cited: 20
Showing 20 citing articles:
Etching and fluorination of yttrium oxide (Y2O3) irradiated with fluorine ions or radicals
Hojun Kang, Tomoko Ito, Junghwan Um, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 1
Closed Access | Times Cited: 1
Hojun Kang, Tomoko Ito, Junghwan Um, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 1
Closed Access | Times Cited: 1
Study of Profile Improvement through shift of phase between RF source and bias at the RF-Biased ICP reactor
Paul Yang, Wan Soo Song, K. H. Ahn, et al.
Vacuum (2025), pp. 114032-114032
Closed Access | Times Cited: 1
Paul Yang, Wan Soo Song, K. H. Ahn, et al.
Vacuum (2025), pp. 114032-114032
Closed Access | Times Cited: 1
Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions
Andreas Kounis-Melas, Joseph R. Vella, Athanassios Z. Panagiotopoulos, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 1
Closed Access
Andreas Kounis-Melas, Joseph R. Vella, Athanassios Z. Panagiotopoulos, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 1
Closed Access
Optical Emission Spectroscopy and Gas Kinetics of Picosecond Laser-Induced Chlorine Dissociation for Atomic Layer Etching of Silicon
Runxuan Li, Matthew Eliceiri, Jingang Li, et al.
The Journal of Physical Chemistry C (2025) Vol. 129, Iss. 5, pp. 2460-2466
Open Access
Runxuan Li, Matthew Eliceiri, Jingang Li, et al.
The Journal of Physical Chemistry C (2025) Vol. 129, Iss. 5, pp. 2460-2466
Open Access
Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two‐Dimensional Perovskite Nanosheets: An AFM Study
Fatma Pinar Gordesli, Begümnur Küçükcan, Özge Sağlam
ChemPlusChem (2025)
Closed Access
Fatma Pinar Gordesli, Begümnur Küçükcan, Özge Sağlam
ChemPlusChem (2025)
Closed Access
Bauschinger effect in nano-grinding of 3C-SiC: a molecular dynamics study
Xiangyang Zhao, Yunqing Tang, Keyang Chen, et al.
Wear (2025), pp. 205847-205847
Closed Access
Xiangyang Zhao, Yunqing Tang, Keyang Chen, et al.
Wear (2025), pp. 205847-205847
Closed Access
Nanocalorimetry for plasma metrology relevant to semiconductor fabrication
J. Trey Diulus, Carles Corbella, Feng Yi, et al.
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2025) Vol. 43, Iss. 2
Closed Access
J. Trey Diulus, Carles Corbella, Feng Yi, et al.
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2025) Vol. 43, Iss. 2
Closed Access
Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model
Yudong Li, Hubertus Marbach, Christian Preischl, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 2
Closed Access
Yudong Li, Hubertus Marbach, Christian Preischl, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 2
Closed Access
Effect of NF3, WF6, and MoF6 Additive Gases on High Aspect Ratio Contact SiO2 Etching in c-C4F8/C4F6/Ar/O2 Plasmas
Hyun Woo Tak, Changsik Choi, Seong Bae Kim, et al.
ACS Applied Electronic Materials (2025)
Closed Access
Hyun Woo Tak, Changsik Choi, Seong Bae Kim, et al.
ACS Applied Electronic Materials (2025)
Closed Access
Texturing injection molds using microelectronics techniques
Louise Burdin, Anne‐Catherine Brulez, Radoslaw Mazurczyk, et al.
Surface and Coatings Technology (2025), pp. 131989-131989
Open Access
Louise Burdin, Anne‐Catherine Brulez, Radoslaw Mazurczyk, et al.
Surface and Coatings Technology (2025), pp. 131989-131989
Open Access
Fiber PROES: Phase resolved optical emission spectroscopy via optical fibers for knowledge-based plasma process development and monitoring
Florian Beckfeld, Matthias Janssen, Constantin Neuroth, et al.
Review of Scientific Instruments (2025) Vol. 96, Iss. 3
Closed Access
Florian Beckfeld, Matthias Janssen, Constantin Neuroth, et al.
Review of Scientific Instruments (2025) Vol. 96, Iss. 3
Closed Access
Valence fragmentation dynamics of a promising low global warming etching gas CF3CHCF2
Toan T. Nguyen, Toshio Hayashi, Hiroshi Iwayama, et al.
Scientific Reports (2025) Vol. 15, Iss. 1
Open Access
Toan T. Nguyen, Toshio Hayashi, Hiroshi Iwayama, et al.
Scientific Reports (2025) Vol. 15, Iss. 1
Open Access
Runaway Electrons in Gas Discharges: Insights from the Numerical Modeling
Dmitry Levko
Plasma (2025) Vol. 8, Iss. 1, pp. 12-12
Open Access
Dmitry Levko
Plasma (2025) Vol. 8, Iss. 1, pp. 12-12
Open Access
Relativistic approach to manipulating angular distribution of charged particles via kinetic equations
Nima Moini, Ali Mesbah
Physical Review Research (2025) Vol. 7, Iss. 2
Open Access
Nima Moini, Ali Mesbah
Physical Review Research (2025) Vol. 7, Iss. 2
Open Access
Printability assessment and modelling for process optimization of 3D Aerosol Jet® printed high aspect ratio microstructures
Elisabetta Ceretti, Mohit Sharma, Eleonora Ferraris, et al.
CIRP Annals (2025)
Open Access
Elisabetta Ceretti, Mohit Sharma, Eleonora Ferraris, et al.
CIRP Annals (2025)
Open Access
Study of Cl2/Ar transient plasmas using a dynamic global model
T. Rasoanarivo, C. Mannequin, Fabrice Roqueta, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 3
Closed Access
T. Rasoanarivo, C. Mannequin, Fabrice Roqueta, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 3
Closed Access
Effect of radio frequency bias on the ion extraction from high-density electropositive plasmas
Dmitry Levko
Journal of Applied Physics (2025) Vol. 137, Iss. 17
Open Access
Dmitry Levko
Journal of Applied Physics (2025) Vol. 137, Iss. 17
Open Access
Fabrication, Microstructure and Plasma Resistance Behavior of Y–Al–Si–O (YAS) Glass-Ceramics Coated on Alumina Ceramics
Eui Keun Park, Hwan-Yoon Jang, Seo-Yeon Jeon, et al.
Materials (2024) Vol. 17, Iss. 18, pp. 4585-4585
Open Access
Eui Keun Park, Hwan-Yoon Jang, Seo-Yeon Jeon, et al.
Materials (2024) Vol. 17, Iss. 18, pp. 4585-4585
Open Access
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning
Yasser Pordeli, Céline Steenge, Erwin Berenschot, et al.
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2024) Vol. 42, Iss. 6
Closed Access
Yasser Pordeli, Céline Steenge, Erwin Berenschot, et al.
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2024) Vol. 42, Iss. 6
Closed Access
Etching approaches for next generation EUV photomask materials
Jeff Chen, Rebecca D. Stern, Rao Yalamanchili, et al.
(2024), pp. 4-4
Closed Access
Jeff Chen, Rebecca D. Stern, Rao Yalamanchili, et al.
(2024), pp. 4-4
Closed Access
Report on laser-induced fluorescence transitions relevant for the microelectronics industry and sustainability applications
V. S. Santosh K. Kondeti, Shurik Yatom, Ivan Romadanov, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Open Access
V. S. Santosh K. Kondeti, Shurik Yatom, Ivan Romadanov, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Open Access
Analysis of Electron Thermal Properties in Ar/O2 Inductively Coupled Plasmas: A Global Model Simulation Using Langmuir Probe Data
Hwiwon Seo, Haneul Lee, Ji-Won Kwon, et al.
Current Applied Physics (2024) Vol. 70, pp. 27-40
Closed Access
Hwiwon Seo, Haneul Lee, Ji-Won Kwon, et al.
Current Applied Physics (2024) Vol. 70, pp. 27-40
Closed Access
Gas Phase Composition and Kinetics of Fluorine Atoms in SF6 Plasma
A. V. Myakon’kikh, Vitaly Kuzmenko, Alexander Efremov, et al.
Russian Microelectronics (2024) Vol. 53, Iss. 6, pp. 582-591
Closed Access
A. V. Myakon’kikh, Vitaly Kuzmenko, Alexander Efremov, et al.
Russian Microelectronics (2024) Vol. 53, Iss. 6, pp. 582-591
Closed Access
