OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Charge Utilization Efficiency and Side Reactions in the Electrochemical Mechanical Polishing of 4H-SiC (0001)
Xiaozhe Yang, Xu Yang, Haiyang Gu, et al.
Journal of The Electrochemical Society (2022) Vol. 169, Iss. 2, pp. 023501-023501
Closed Access | Times Cited: 15
Xiaozhe Yang, Xu Yang, Haiyang Gu, et al.
Journal of The Electrochemical Society (2022) Vol. 169, Iss. 2, pp. 023501-023501
Closed Access | Times Cited: 15
Showing 15 citing articles:
Environment-friendly electrochemical mechanical polishing using solid polymer electrolyte/CeO2 composite pad for highly efficient finishing of 4H-SiC (0001) surface
Junji Murata, Kenshin Hayama, Masaru Takizawa
Applied Surface Science (2023) Vol. 625, pp. 157190-157190
Open Access | Times Cited: 34
Junji Murata, Kenshin Hayama, Masaru Takizawa
Applied Surface Science (2023) Vol. 625, pp. 157190-157190
Open Access | Times Cited: 34
Polishing performance and mechanism of a novel Fe-based slurry for chemical mechanical polishing
Shi-Dong Chen, Hong Lei
Tribology International (2024) Vol. 194, pp. 109549-109549
Closed Access | Times Cited: 15
Shi-Dong Chen, Hong Lei
Tribology International (2024) Vol. 194, pp. 109549-109549
Closed Access | Times Cited: 15
Sustainable Electrochemical Mechanical Polishing (ECMP) for 4H-SiC wafer using chemical-free polishing slurry with hydrocarbon-based solid polymer electrolyte
Naoki Inada, Masaru Takizawa, M. Adachi, et al.
Applied Surface Science (2024) Vol. 664, pp. 160241-160241
Open Access | Times Cited: 13
Naoki Inada, Masaru Takizawa, M. Adachi, et al.
Applied Surface Science (2024) Vol. 664, pp. 160241-160241
Open Access | Times Cited: 13
Atomistic mechanisms of SiC electrochemical mechanical polishing in aqueous H2O2: A ReaxFF molecular dynamics study
Rui Zhu, Tianyu Zhang, Qingyu Yao, et al.
Journal of Manufacturing Processes (2025) Vol. 136, pp. 56-67
Closed Access | Times Cited: 1
Rui Zhu, Tianyu Zhang, Qingyu Yao, et al.
Journal of Manufacturing Processes (2025) Vol. 136, pp. 56-67
Closed Access | Times Cited: 1
Investigation of Fenton-electrochemical oxidation behavior and polishing mechanism of SiC
Hyeok-Joong Kang, Min Zhong, Xiaobing Li, et al.
Precision Engineering (2025)
Closed Access | Times Cited: 1
Hyeok-Joong Kang, Min Zhong, Xiaobing Li, et al.
Precision Engineering (2025)
Closed Access | Times Cited: 1
Slurryless electrochemical mechanical polishing of 4-inch 4H–SiC (0001) and (000–1) surfaces
Xu Yang, Xiaozhe Yang, Kazufumi Aoki, et al.
Precision Engineering (2023) Vol. 83, pp. 237-249
Open Access | Times Cited: 14
Xu Yang, Xiaozhe Yang, Kazufumi Aoki, et al.
Precision Engineering (2023) Vol. 83, pp. 237-249
Open Access | Times Cited: 14
Oxidation behavior and mechanism of 4H-SiC surface by holes in electrochemical and photoelectrochemical systems
Yang Zhao, Shang Gao, Yuewen Sun, et al.
Applied Surface Science (2024), pp. 162010-162010
Closed Access | Times Cited: 4
Yang Zhao, Shang Gao, Yuewen Sun, et al.
Applied Surface Science (2024), pp. 162010-162010
Closed Access | Times Cited: 4
Selective electrochemical mechanical polishing of 4H–SiC surface employing porous material impregnated with electrolyte
Xiaozhe Yang, Xu Yang, Zhuangde Jiang, et al.
Ceramics International (2023) Vol. 49, Iss. 22, pp. 34569-34581
Closed Access | Times Cited: 10
Xiaozhe Yang, Xu Yang, Zhuangde Jiang, et al.
Ceramics International (2023) Vol. 49, Iss. 22, pp. 34569-34581
Closed Access | Times Cited: 10
Effects of electrolyte type and concentration on the anodic oxidation of 4H-SiC (0001) in slurryless electrochemical mechanical polishing
Xiaozhe Yang, Xu Yang, Kazuya Yamamura
Electrochimica Acta (2023) Vol. 474, pp. 143531-143531
Closed Access | Times Cited: 10
Xiaozhe Yang, Xu Yang, Kazuya Yamamura
Electrochimica Acta (2023) Vol. 474, pp. 143531-143531
Closed Access | Times Cited: 10
Electric-field-modulated oxidation and its effect on photoelectrochemical mechanical polishing of 4H-SiC
Yang Zhao, Shang Gao, Yuewen Sun, et al.
International Journal of Mechanical Sciences (2025), pp. 110247-110247
Closed Access
Yang Zhao, Shang Gao, Yuewen Sun, et al.
International Journal of Mechanical Sciences (2025), pp. 110247-110247
Closed Access
Effect of Voltage on Electrochemical Mechanical Polishing (ECMP) of 4H-SiC with Fixed Abrasives
Pengfei Wu, Dongdong Zhao, Ning Liu, et al.
Journal of Materials Research and Technology (2025) Vol. 36, pp. 7807-7817
Open Access
Pengfei Wu, Dongdong Zhao, Ning Liu, et al.
Journal of Materials Research and Technology (2025) Vol. 36, pp. 7807-7817
Open Access
Insight into the atomic-scale material removal of 4H-SiC electrochemical mechanical polishing (ECMP) using graphene oxide
Zirui Wang, Yuguang Zhu, Ronghao Ren, et al.
Tribology International (2025), pp. 110803-110803
Closed Access
Zirui Wang, Yuguang Zhu, Ronghao Ren, et al.
Tribology International (2025), pp. 110803-110803
Closed Access
A new polishing method for complex structural parts: Moist particle electrolyte electrochemical mechanical polishing (MPE-ECMP)
Jirui Cheng, Renke Kang, Zhigang Dong, et al.
Electrochemistry Communications (2023) Vol. 150, pp. 107475-107475
Open Access | Times Cited: 5
Jirui Cheng, Renke Kang, Zhigang Dong, et al.
Electrochemistry Communications (2023) Vol. 150, pp. 107475-107475
Open Access | Times Cited: 5
Piezocatalysis for Chemical–Mechanical Polishing of SiC: Dual Roles of t‐BaTiO3 as a Piezocatalyst and an Abrasive
Tao Hu, Jinxi Feng, Wen Yan, et al.
Small (2023) Vol. 20, Iss. 21
Closed Access | Times Cited: 5
Tao Hu, Jinxi Feng, Wen Yan, et al.
Small (2023) Vol. 20, Iss. 21
Closed Access | Times Cited: 5
A comparative study of Polarimetric sensing with freestanding n-type porous silicon and porous alumina membrane
Neeraj Kumar, T. Arun Kumar, Deepak Kumar, et al.
Materials Chemistry and Physics (2023) Vol. 301, pp. 127575-127575
Closed Access | Times Cited: 1
Neeraj Kumar, T. Arun Kumar, Deepak Kumar, et al.
Materials Chemistry and Physics (2023) Vol. 301, pp. 127575-127575
Closed Access | Times Cited: 1
Atomistic Mechanisms of Sic Electrochemical Mechanical Polishing in Aqueous H2o2: Molecular Dynamics Simulations Using Reaxff Reactive Force Field
Rui Zhu, Feng Cheng, Qingyu Yao, et al.
(2024)
Closed Access
Rui Zhu, Feng Cheng, Qingyu Yao, et al.
(2024)
Closed Access
