
OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications
Alain E. Kaloyeros, Youlin Pan, Jonathan Goff, et al.
ECS Journal of Solid State Science and Technology (2020) Vol. 9, Iss. 6, pp. 063006-063006
Open Access | Times Cited: 114
Alain E. Kaloyeros, Youlin Pan, Jonathan Goff, et al.
ECS Journal of Solid State Science and Technology (2020) Vol. 9, Iss. 6, pp. 063006-063006
Open Access | Times Cited: 114
Showing 1-25 of 114 citing articles:
Extending the spectrum of fully integrated photonics to submicrometre wavelengths
Minh A. Tran, Chong Zhang, Theodore Morin, et al.
Nature (2022) Vol. 610, Iss. 7930, pp. 54-60
Open Access | Times Cited: 119
Minh A. Tran, Chong Zhang, Theodore Morin, et al.
Nature (2022) Vol. 610, Iss. 7930, pp. 54-60
Open Access | Times Cited: 119
Hybrid and heterogeneous photonic integration
Paramjeet Kaur, Andreas Boes, Guanghui Ren, et al.
APL Photonics (2021) Vol. 6, Iss. 6
Open Access | Times Cited: 112
Paramjeet Kaur, Andreas Boes, Guanghui Ren, et al.
APL Photonics (2021) Vol. 6, Iss. 6
Open Access | Times Cited: 112
Design and Simulation of SPR Sensors by Employing Silicon and Silicon-Nitride With Mono and Bimetal Layers for Sensitivity Enhancement
Shatrughna Kumar, Archana Yadav, Santosh Kumar, et al.
IEEE Sensors Journal (2024) Vol. 24, Iss. 6, pp. 7671-7680
Closed Access | Times Cited: 23
Shatrughna Kumar, Archana Yadav, Santosh Kumar, et al.
IEEE Sensors Journal (2024) Vol. 24, Iss. 6, pp. 7671-7680
Closed Access | Times Cited: 23
Enhancing photovoltaic cell efficiency: A comprehensive study on BN-Si3N4 blend antireflective coatings and their impact on power conversion
Fatemah H. Alkallas, Eman A. Mwafy, Gobinath Velu Kaliyannan, et al.
Ceramics International (2024) Vol. 50, Iss. 13, pp. 23958-23969
Closed Access | Times Cited: 11
Fatemah H. Alkallas, Eman A. Mwafy, Gobinath Velu Kaliyannan, et al.
Ceramics International (2024) Vol. 50, Iss. 13, pp. 23958-23969
Closed Access | Times Cited: 11
Review—Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part II. PVD and Alternative (Non-PVD and Non-CVD) Deposition Techniques
Alain E. Kaloyeros, Barry Arkles
ECS Journal of Solid State Science and Technology (2024) Vol. 13, Iss. 4, pp. 043001-043001
Open Access | Times Cited: 10
Alain E. Kaloyeros, Barry Arkles
ECS Journal of Solid State Science and Technology (2024) Vol. 13, Iss. 4, pp. 043001-043001
Open Access | Times Cited: 10
Comparative analysis of nanomechanical resonators: sensitivity, response time, and practical considerations in photothermal sensing
Kostas Kanellopulos, Friedrich Ladinig, Stefan Emminger, et al.
Microsystems & Nanoengineering (2025) Vol. 11, Iss. 1
Open Access | Times Cited: 1
Kostas Kanellopulos, Friedrich Ladinig, Stefan Emminger, et al.
Microsystems & Nanoengineering (2025) Vol. 11, Iss. 1
Open Access | Times Cited: 1
Silicon Nitride and Hydrogenated Silicon Nitride Thin Films: A Review of Fabrication Methods and Applications
Nikolett Hegedüs, Katalin Balázsi, Csaba Balázsi
Materials (2021) Vol. 14, Iss. 19, pp. 5658-5658
Open Access | Times Cited: 55
Nikolett Hegedüs, Katalin Balázsi, Csaba Balázsi
Materials (2021) Vol. 14, Iss. 19, pp. 5658-5658
Open Access | Times Cited: 55
Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications - Part I Thermal and Plasma CVD
Alain E. Kaloyeros, Barry Arkles
ECS Journal of Solid State Science and Technology (2023) Vol. 12, Iss. 10, pp. 103001-103001
Open Access | Times Cited: 16
Alain E. Kaloyeros, Barry Arkles
ECS Journal of Solid State Science and Technology (2023) Vol. 12, Iss. 10, pp. 103001-103001
Open Access | Times Cited: 16
Etching Mechanism Based on Hydrogen Fluoride Interactions with Hydrogenated SiN Films Using HF/H2 and CF4/H2 Plasmas
Shih‐Nan Hsiao, Nikolay Britun, Thi‐Thuy‐Nga Nguyen, et al.
ACS Applied Electronic Materials (2023) Vol. 5, Iss. 12, pp. 6797-6804
Closed Access | Times Cited: 14
Shih‐Nan Hsiao, Nikolay Britun, Thi‐Thuy‐Nga Nguyen, et al.
ACS Applied Electronic Materials (2023) Vol. 5, Iss. 12, pp. 6797-6804
Closed Access | Times Cited: 14
Effects of rare-earth oxides on grain boundary strength of silicon nitride ceramics
Komaki Matsuura, Tatsuki Ohji, Takuma Takahashi, et al.
Journal of the European Ceramic Society (2024) Vol. 44, Iss. 14, pp. 116672-116672
Open Access | Times Cited: 6
Komaki Matsuura, Tatsuki Ohji, Takuma Takahashi, et al.
Journal of the European Ceramic Society (2024) Vol. 44, Iss. 14, pp. 116672-116672
Open Access | Times Cited: 6
Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride
Khabib Khumaini, Yewon Kim, Romel Hidayat, et al.
Applied Surface Science (2024) Vol. 654, pp. 159414-159414
Closed Access | Times Cited: 5
Khabib Khumaini, Yewon Kim, Romel Hidayat, et al.
Applied Surface Science (2024) Vol. 654, pp. 159414-159414
Closed Access | Times Cited: 5
Sustainable preparation of aminosilane monomers, oligomers, and polymers through Si–N dehydrocoupling catalysis
Brock E. Leland, Joydeb Mondal, Ryan J. Trovitch
Chemical Communications (2023) Vol. 59, Iss. 25, pp. 3665-3684
Closed Access | Times Cited: 13
Brock E. Leland, Joydeb Mondal, Ryan J. Trovitch
Chemical Communications (2023) Vol. 59, Iss. 25, pp. 3665-3684
Closed Access | Times Cited: 13
Silicon Compound Nanomaterials: Exploring Emission Mechanisms and Photobiological Applications
Ateet Dutt, Rafael A. Salinas, Shirlley E. Martínez Tolibia, et al.
Advanced Photonics Research (2023) Vol. 4, Iss. 8
Open Access | Times Cited: 10
Ateet Dutt, Rafael A. Salinas, Shirlley E. Martínez Tolibia, et al.
Advanced Photonics Research (2023) Vol. 4, Iss. 8
Open Access | Times Cited: 10
Properties of SiCN Films Relevant to Dental Implant Applications
Xinyi Xia, Chao-Ching Chiang, Sarathy K. Gopalakrishnan, et al.
Materials (2023) Vol. 16, Iss. 15, pp. 5318-5318
Open Access | Times Cited: 10
Xinyi Xia, Chao-Ching Chiang, Sarathy K. Gopalakrishnan, et al.
Materials (2023) Vol. 16, Iss. 15, pp. 5318-5318
Open Access | Times Cited: 10
Boron nitride nanosheet @ quantum‐sized diamond nanocrystal complex/epoxy nanocomposites with enhancing thermal conductivity and sufficient dielectric breakdown strength
Zhengdong Wang, Yuanhang Zhou, Tong Zhang, et al.
Polymer Composites (2023) Vol. 45, Iss. 4, pp. 3210-3224
Closed Access | Times Cited: 10
Zhengdong Wang, Yuanhang Zhou, Tong Zhang, et al.
Polymer Composites (2023) Vol. 45, Iss. 4, pp. 3210-3224
Closed Access | Times Cited: 10
Chemical and mechanical performances of CVD‑silicon oxycarbonitride films for corrosion protection applications: Towards inert coatings in aggressive aqueous media
Farah Inoubli, Babacar Diallo, Konstantina Christina Topka, et al.
Surface and Coatings Technology (2025) Vol. 497, pp. 131756-131756
Closed Access
Farah Inoubli, Babacar Diallo, Konstantina Christina Topka, et al.
Surface and Coatings Technology (2025) Vol. 497, pp. 131756-131756
Closed Access
Plasma atomic layer etching of SiO2 and Si3N4 using low global warming hexafluoropropene
Minsuk Choi, Hyeongwu Lee, Thomas A. Jung, et al.
Journal of the Korean Physical Society (2025)
Closed Access
Minsuk Choi, Hyeongwu Lee, Thomas A. Jung, et al.
Journal of the Korean Physical Society (2025)
Closed Access
Time-of-flight appearance potential mass spectrometry of a radio frequency discharge supersonic jet nitrogen source
N. SMITH, A. J. Pedersen, H. Henry Lamb
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 2
Closed Access
N. SMITH, A. J. Pedersen, H. Henry Lamb
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025) Vol. 43, Iss. 2
Closed Access
Surface stress modification of silicon nitride film via argon gas cluster ion beam
Masaya Takeuchi, Noriaki Toyoda
MRS Advances (2025) Vol. 10, Iss. 2, pp. 229-233
Closed Access
Masaya Takeuchi, Noriaki Toyoda
MRS Advances (2025) Vol. 10, Iss. 2, pp. 229-233
Closed Access
Mechanical Properties of Silicon Nitride Ceramics Determined by Microcantilever Tests – A Comprehensive Overview
Junichi Tatami, Tatsuki Ohji
Transactions of the Indian Ceramic Society (2025), pp. 1-9
Closed Access
Junichi Tatami, Tatsuki Ohji
Transactions of the Indian Ceramic Society (2025), pp. 1-9
Closed Access
Reliability Challenges, Models, and Physics of Silicon Carbide and Gallium Nitride Power Devices
Tsuriel Avraham, Mahesh H. Dhyani, J.B. Bernstein
Energies (2025) Vol. 18, Iss. 5, pp. 1046-1046
Open Access
Tsuriel Avraham, Mahesh H. Dhyani, J.B. Bernstein
Energies (2025) Vol. 18, Iss. 5, pp. 1046-1046
Open Access
Structure and Selected Properties of Si(C,N) Coatings on Ni-Cr Prosthetic Alloys
Zofia Kula, Katarzyna Dąbrowska, L. Klimek
Processes (2025) Vol. 13, Iss. 3, pp. 624-624
Open Access
Zofia Kula, Katarzyna Dąbrowska, L. Klimek
Processes (2025) Vol. 13, Iss. 3, pp. 624-624
Open Access
Evaluation and Characterization of High-Uniformity SiNx Thin Film with Controllable Refractive Index by Home-Made Cat-CVD Based on Orthogonal Experiments
Caifang Li, Minghui Li, Jinsong Shi, et al.
Molecules (2025) Vol. 30, Iss. 5, pp. 1091-1091
Open Access
Caifang Li, Minghui Li, Jinsong Shi, et al.
Molecules (2025) Vol. 30, Iss. 5, pp. 1091-1091
Open Access
Enhanced Field-Assisted Passivation and Optical Properties Improvement of PECVD Deposited SiNx:H Thin Film
Alamgeer, Hasnain Yousuf, Muhammad Quddamah Khokhar, et al.
Optical Materials (2025) Vol. 162, pp. 116885-116885
Closed Access
Alamgeer, Hasnain Yousuf, Muhammad Quddamah Khokhar, et al.
Optical Materials (2025) Vol. 162, pp. 116885-116885
Closed Access
Hybrid Thin Film Coating Performance and Functional Characteristics of Silicon Nitride (SiNx) Layer for Solar Cell Application
R. Venkatesh, Ravindra Pratap Singh, Nagabhooshanam Nagarajan, et al.
Journal of Electronic Materials (2025)
Closed Access
R. Venkatesh, Ravindra Pratap Singh, Nagabhooshanam Nagarajan, et al.
Journal of Electronic Materials (2025)
Closed Access