OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Influence of NF3 Plasma-Treated HfO2 Gate Insulator Surface on Tin Oxide Thin-Film Transistors
Christophe Avis, Jin Jang
Materials (2023) Vol. 16, Iss. 22, pp. 7172-7172
Open Access | Times Cited: 2
Christophe Avis, Jin Jang
Materials (2023) Vol. 16, Iss. 22, pp. 7172-7172
Open Access | Times Cited: 2
Showing 2 citing articles:
Highly Robust Spray‐Pyrolyzed Al2O3 Gate Insulator for Flexible a‐IGZO Thin‐Film Transistors for Low‐Power Displays
Kiwan Ahn, Md Mobaidul Islam, Yeoungjin Chang, et al.
physica status solidi (a) (2025)
Closed Access
Kiwan Ahn, Md Mobaidul Islam, Yeoungjin Chang, et al.
physica status solidi (a) (2025)
Closed Access
Stability Improvement of Solution-Processed Metal Oxide Thin-Film Transistors Using Fluorine-Doped Zirconium Oxide Dielectric
Haoxuan Xu, Bo Deng, Xinan Zhang
Materials (2025) Vol. 18, Iss. 9, pp. 1980-1980
Open Access
Haoxuan Xu, Bo Deng, Xinan Zhang
Materials (2025) Vol. 18, Iss. 9, pp. 1980-1980
Open Access
